Concurrent reactive ion etching employing micromachined ionic liquid ion source array

Ryo Yoshida, Motoaki Hara, Hiroyuki Oguchi, Tatsuya Suzuki, Hiroki Kuwano

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

This paper describes concurrent reactive ion etching using micro ionic liquid ion source (ILIS) array. The system consists of micro needle emitters and a reservoir for the ionic liquid (IL) of 1-ethyl-3-methylimidazolium tetrafluoroborate ([EMIM]-[BF4]). The ion beam etching of a (100) silicon substrate using the fabricated ILIS array was demonstrated. As a result of mass spectroscopy during the etching, the peaks of SiF+, SiF 2+, and SiF3+ were observed. The chemical reaction between the silicon and fluorine based ions from the IL was confirmed. Also, etching rate of the silicon using the ILIS array applying 5.1 kV ion-acceleration voltage was calculated from the etched dimple on the substrate and was 1.5 times larger than that of a conventional focused Ga + ion beam applying 30 kV ion-acceleration voltage.

Original languageEnglish
Title of host publicationMEMS 2014 - 27th IEEE International Conference on Micro Electro Mechanical Systems
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages463-466
Number of pages4
ISBN (Print)9781479935086
DOIs
Publication statusPublished - 2014
Externally publishedYes
Event27th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2014 - San Francisco, CA, United States
Duration: 2014 Jan 262014 Jan 30

Publication series

NameProceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
ISSN (Print)1084-6999

Conference

Conference27th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2014
CountryUnited States
CitySan Francisco, CA
Period14/1/2614/1/30

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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  • Cite this

    Yoshida, R., Hara, M., Oguchi, H., Suzuki, T., & Kuwano, H. (2014). Concurrent reactive ion etching employing micromachined ionic liquid ion source array. In MEMS 2014 - 27th IEEE International Conference on Micro Electro Mechanical Systems (pp. 463-466). [6765677] (Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/MEMSYS.2014.6765677