Construction of superconducting bulk magnet magnetron sputtering apparatus for fabrication of highly reflective optical mirrors

Uichiro Mizutani, Takashi Yamaguchi, Hiroshi Ikuta, Tetsuya Tomofuji, Yosuke Yanagi, Yoshitaka Itoh, Tetsuo Oka

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

We have developed the two-cathode magnetron sputtering apparatus equipped with superconducting permanent magnet to produce Mo/Si multi-layer films, which would potentially serve as a high-quality optical mirror at extreme ultraviolet (EUV) wavelength of 13.5 nm. The best deposition condition was searched by analyzing the structure of the inter-diffusion layer formed in the Mo/Si bi-layer film prepared under different deposition conditions. It was found that (1) Xe gas should be used as inert gas species, (2) its pressure is lower than 4 × 10-2 Pa, (3) a throw distance is longer than 250 mm and (4) discharge voltage around 2 kV. By making full use of these data, we synthesized Mo/Si multi-layer films and analyzed the structure and its effect on the reflectivity. The highest EUV-reflectivity so far obtained is 67% in the normal incident condition.

Original languageEnglish
Pages (from-to)84-89
Number of pages6
JournalMaterials Science and Engineering B: Solid-State Materials for Advanced Technology
Volume151
Issue number1
DOIs
Publication statusPublished - 2008 Jun 15
Externally publishedYes

Fingerprint

Multilayer films
Magnetron sputtering
Magnets
magnetron sputtering
magnets
mirrors
Noble Gases
Fabrication
fabrication
Superconducting magnets
Inert gases
Permanent magnets
Mirrors
Cathodes
Gases
reflectance
Wavelength
Electric potential
superconducting magnets
permanent magnets

Keywords

  • EUV-lithography
  • Magnetron sputtering
  • Optical mirror
  • Superconducting permanent magnet

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Construction of superconducting bulk magnet magnetron sputtering apparatus for fabrication of highly reflective optical mirrors. / Mizutani, Uichiro; Yamaguchi, Takashi; Ikuta, Hiroshi; Tomofuji, Tetsuya; Yanagi, Yosuke; Itoh, Yoshitaka; Oka, Tetsuo.

In: Materials Science and Engineering B: Solid-State Materials for Advanced Technology, Vol. 151, No. 1, 15.06.2008, p. 84-89.

Research output: Contribution to journalArticle

Mizutani, Uichiro ; Yamaguchi, Takashi ; Ikuta, Hiroshi ; Tomofuji, Tetsuya ; Yanagi, Yosuke ; Itoh, Yoshitaka ; Oka, Tetsuo. / Construction of superconducting bulk magnet magnetron sputtering apparatus for fabrication of highly reflective optical mirrors. In: Materials Science and Engineering B: Solid-State Materials for Advanced Technology. 2008 ; Vol. 151, No. 1. pp. 84-89.
@article{b6e22a11e28c445c85849edc1b544b1f,
title = "Construction of superconducting bulk magnet magnetron sputtering apparatus for fabrication of highly reflective optical mirrors",
abstract = "We have developed the two-cathode magnetron sputtering apparatus equipped with superconducting permanent magnet to produce Mo/Si multi-layer films, which would potentially serve as a high-quality optical mirror at extreme ultraviolet (EUV) wavelength of 13.5 nm. The best deposition condition was searched by analyzing the structure of the inter-diffusion layer formed in the Mo/Si bi-layer film prepared under different deposition conditions. It was found that (1) Xe gas should be used as inert gas species, (2) its pressure is lower than 4 × 10-2 Pa, (3) a throw distance is longer than 250 mm and (4) discharge voltage around 2 kV. By making full use of these data, we synthesized Mo/Si multi-layer films and analyzed the structure and its effect on the reflectivity. The highest EUV-reflectivity so far obtained is 67{\%} in the normal incident condition.",
keywords = "EUV-lithography, Magnetron sputtering, Optical mirror, Superconducting permanent magnet",
author = "Uichiro Mizutani and Takashi Yamaguchi and Hiroshi Ikuta and Tetsuya Tomofuji and Yosuke Yanagi and Yoshitaka Itoh and Tetsuo Oka",
year = "2008",
month = "6",
day = "15",
doi = "10.1016/j.mseb.2008.03.021",
language = "English",
volume = "151",
pages = "84--89",
journal = "Materials Science and Engineering B: Solid-State Materials for Advanced Technology",
issn = "0921-5107",
publisher = "Elsevier BV",
number = "1",

}

TY - JOUR

T1 - Construction of superconducting bulk magnet magnetron sputtering apparatus for fabrication of highly reflective optical mirrors

AU - Mizutani, Uichiro

AU - Yamaguchi, Takashi

AU - Ikuta, Hiroshi

AU - Tomofuji, Tetsuya

AU - Yanagi, Yosuke

AU - Itoh, Yoshitaka

AU - Oka, Tetsuo

PY - 2008/6/15

Y1 - 2008/6/15

N2 - We have developed the two-cathode magnetron sputtering apparatus equipped with superconducting permanent magnet to produce Mo/Si multi-layer films, which would potentially serve as a high-quality optical mirror at extreme ultraviolet (EUV) wavelength of 13.5 nm. The best deposition condition was searched by analyzing the structure of the inter-diffusion layer formed in the Mo/Si bi-layer film prepared under different deposition conditions. It was found that (1) Xe gas should be used as inert gas species, (2) its pressure is lower than 4 × 10-2 Pa, (3) a throw distance is longer than 250 mm and (4) discharge voltage around 2 kV. By making full use of these data, we synthesized Mo/Si multi-layer films and analyzed the structure and its effect on the reflectivity. The highest EUV-reflectivity so far obtained is 67% in the normal incident condition.

AB - We have developed the two-cathode magnetron sputtering apparatus equipped with superconducting permanent magnet to produce Mo/Si multi-layer films, which would potentially serve as a high-quality optical mirror at extreme ultraviolet (EUV) wavelength of 13.5 nm. The best deposition condition was searched by analyzing the structure of the inter-diffusion layer formed in the Mo/Si bi-layer film prepared under different deposition conditions. It was found that (1) Xe gas should be used as inert gas species, (2) its pressure is lower than 4 × 10-2 Pa, (3) a throw distance is longer than 250 mm and (4) discharge voltage around 2 kV. By making full use of these data, we synthesized Mo/Si multi-layer films and analyzed the structure and its effect on the reflectivity. The highest EUV-reflectivity so far obtained is 67% in the normal incident condition.

KW - EUV-lithography

KW - Magnetron sputtering

KW - Optical mirror

KW - Superconducting permanent magnet

UR - http://www.scopus.com/inward/record.url?scp=47649100091&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=47649100091&partnerID=8YFLogxK

U2 - 10.1016/j.mseb.2008.03.021

DO - 10.1016/j.mseb.2008.03.021

M3 - Article

AN - SCOPUS:47649100091

VL - 151

SP - 84

EP - 89

JO - Materials Science and Engineering B: Solid-State Materials for Advanced Technology

JF - Materials Science and Engineering B: Solid-State Materials for Advanced Technology

SN - 0921-5107

IS - 1

ER -