Control of Threshold Voltage of AlGaAs/GaAs 2DEG FET's through Heat Treatment

Y. Takanashi, M. Hirano, T. Sugeta

    Research output: Contribution to journalArticle

    6 Citations (Scopus)

    Abstract

    Threshold voltage controls of Ni/Ti/Au gate and Ti/Au gate 2DEG AlGaAs/GaAs FET's through only heat treatment are investigated. Ni/Ti/Au gate FET's vary over quite a wide range from a depletion mode to an enhancement mode without degradation of FET characteristics after heat treatment at 300°C. The same experiment is made for Ti/Au gate FET's, but the threshold voltage change is negligibly small. It is confirmed that Ni/Ti/Au can be used as the gate metal for E-FET and Ti/Au as the gate metal for D-FET under simultaneous heat treatment. In addition, a mechanism for penetrating the barrier metal into the underlying layer is discussed.

    Original languageEnglish
    Pages (from-to)241-243
    Number of pages3
    JournalIEEE Electron Device Letters
    Volume5
    Issue number7
    DOIs
    Publication statusPublished - 1984 Jul

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Electrical and Electronic Engineering

    Fingerprint Dive into the research topics of 'Control of Threshold Voltage of AlGaAs/GaAs 2DEG FET's through Heat Treatment'. Together they form a unique fingerprint.

  • Cite this