Correlation between the luminescence properties and the surface structures of submicron silica particles

Seiichiro Inai, Akira Harao, Hiroyuki Nishikawa

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

We investigated the correlation between the luminescence properties and the surface structures of submicron silica particles prepared by the Stöber method. After annealing in a non-oxidizing atmosphere, the submicron-sized silica particles show a broad photoluminescence (PL) band at 500-540 nm by excitation at an ultraviolet wavelengths (254 and 365 nm), and the one at the 600 nm by excitation an Ar+ laser (488 nm). The PL appeared to result from the removal of impurities and subsequent formation of several luminescent structures on the internal surface of the primary particles by thermal annealing.

Original languageEnglish
Pages (from-to)510-513
Number of pages4
JournalJournal of Non-Crystalline Solids
Volume353
Issue number5-7
DOIs
Publication statusPublished - 2007 Apr 1

Fingerprint

Surface structure
Silicon Dioxide
Luminescence
Photoluminescence
Silica
Annealing
luminescence
silicon dioxide
photoluminescence
annealing
Impurities
Wavelength
excitation
Lasers
atmospheres
impurities
wavelengths
lasers
Hot Temperature

Keywords

  • Optical properties
  • Photoluminescence

ASJC Scopus subject areas

  • Ceramics and Composites
  • Electronic, Optical and Magnetic Materials

Cite this

Correlation between the luminescence properties and the surface structures of submicron silica particles. / Inai, Seiichiro; Harao, Akira; Nishikawa, Hiroyuki.

In: Journal of Non-Crystalline Solids, Vol. 353, No. 5-7, 01.04.2007, p. 510-513.

Research output: Contribution to journalArticle

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AB - We investigated the correlation between the luminescence properties and the surface structures of submicron silica particles prepared by the Stöber method. After annealing in a non-oxidizing atmosphere, the submicron-sized silica particles show a broad photoluminescence (PL) band at 500-540 nm by excitation at an ultraviolet wavelengths (254 and 365 nm), and the one at the 600 nm by excitation an Ar+ laser (488 nm). The PL appeared to result from the removal of impurities and subsequent formation of several luminescent structures on the internal surface of the primary particles by thermal annealing.

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