Crystallinity of ZnO Films Prepared byRF Plasma CVD

K.Suzuki K.Suzuki, Y.Ishizaki Y.Ishizaki, N.Saito N.Saito, O.Takai O.Takai, Takahiro Ishizaki

Research output: Contribution to journalArticle

Original languageEnglish
JournalDefault journal
Publication statusPublished - 2008

Cite this

K.Suzuki, K. S., Y.Ishizaki, Y. I., N.Saito, N. S., O.Takai, O. T., & Ishizaki, T. (2008). Crystallinity of ZnO Films Prepared byRF Plasma CVD. Default journal.

Crystallinity of ZnO Films Prepared byRF Plasma CVD. / K.Suzuki, K.Suzuki; Y.Ishizaki, Y.Ishizaki; N.Saito, N.Saito; O.Takai, O.Takai; Ishizaki, Takahiro.

In: Default journal, 2008.

Research output: Contribution to journalArticle

K.Suzuki, KS, Y.Ishizaki, YI, N.Saito, NS, O.Takai, OT & Ishizaki, T 2008, 'Crystallinity of ZnO Films Prepared byRF Plasma CVD', Default journal.
K.Suzuki KS, Y.Ishizaki YI, N.Saito NS, O.Takai OT, Ishizaki T. Crystallinity of ZnO Films Prepared byRF Plasma CVD. Default journal. 2008.
K.Suzuki, K.Suzuki ; Y.Ishizaki, Y.Ishizaki ; N.Saito, N.Saito ; O.Takai, O.Takai ; Ishizaki, Takahiro. / Crystallinity of ZnO Films Prepared byRF Plasma CVD. In: Default journal. 2008.
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