Crystallographic orientation change with line-width for CVD Cu damascene interconnection

K.Ueno K.Ueno, Y.Tsuchiya Y.Tsuchiya, N.Itoh N.Itoh, T.Kikkawa T.Kikkawa, A.Sekiguchi A.Sekiguchi, Kazuyoshi Ueno

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	489-494
Journal	Advanced Metallization and Interconnect Systems for ULSI Applications in 1997
Publication status	Published - 1997 Oct 1

Cite this

@article{e41b86255e284a9aaa965304ea0ad2ea,

title = "Crystallographic orientation change with line-width for CVD Cu damascene interconnection",

author = "K.Ueno K.Ueno and Y.Tsuchiya Y.Tsuchiya and N.Itoh N.Itoh and T.Kikkawa T.Kikkawa and A.Sekiguchi A.Sekiguchi and Kazuyoshi Ueno",

year = "1997",

month = oct,

day = "1",

language = "English",

pages = "489--494",

journal = "Advanced Metallization and Interconnect Systems for ULSI Applications in 1997",

}

TY - JOUR

T1 - Crystallographic orientation change with line-width for CVD Cu damascene interconnection

AU - K.Ueno, K.Ueno

AU - Y.Tsuchiya, Y.Tsuchiya

AU - N.Itoh, N.Itoh

AU - T.Kikkawa, T.Kikkawa

AU - A.Sekiguchi, A.Sekiguchi

AU - Ueno, Kazuyoshi

PY - 1997/10/1

Y1 - 1997/10/1

M3 - Article

SP - 489

EP - 494

JO - Advanced Metallization and Interconnect Systems for ULSI Applications in 1997

JF - Advanced Metallization and Interconnect Systems for ULSI Applications in 1997

ER -