Original language | English |
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Pages (from-to) | 489-494 |
Journal | Advanced Metallization and Interconnect Systems for ULSI Applications in 1997 |
Publication status | Published - 1997 Oct 1 |
Crystallographic orientation change with line-width for CVD Cu damascene interconnection
K.Ueno K.Ueno, Y.Tsuchiya Y.Tsuchiya, N.Itoh N.Itoh, T.Kikkawa T.Kikkawa, A.Sekiguchi A.Sekiguchi, Kazuyoshi Ueno
Research output: Contribution to journal › Article › peer-review