Crystallographic orientation change with line-width for CVD Cu damascene interconnection

K.Ueno K.Ueno, Y.Tsuchiya Y.Tsuchiya, N.Itoh N.Itoh, T.Kikkawa T.Kikkawa, A.Sekiguchi A.Sekiguchi, Kazuyoshi Ueno

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)489-494
JournalAdvanced Metallization and Interconnect Systems for ULSI Applications in 1997
Publication statusPublished - 1997 Oct 1

Cite this

Crystallographic orientation change with line-width for CVD Cu damascene interconnection. / K.Ueno, K.Ueno; Y.Tsuchiya, Y.Tsuchiya; N.Itoh, N.Itoh; T.Kikkawa, T.Kikkawa; A.Sekiguchi, A.Sekiguchi; Ueno, Kazuyoshi.

In: Advanced Metallization and Interconnect Systems for ULSI Applications in 1997, 01.10.1997, p. 489-494.

Research output: Contribution to journalArticle

K.Ueno, K.Ueno ; Y.Tsuchiya, Y.Tsuchiya ; N.Itoh, N.Itoh ; T.Kikkawa, T.Kikkawa ; A.Sekiguchi, A.Sekiguchi ; Ueno, Kazuyoshi. / Crystallographic orientation change with line-width for CVD Cu damascene interconnection. In: Advanced Metallization and Interconnect Systems for ULSI Applications in 1997. 1997 ; pp. 489-494.
@article{e41b86255e284a9aaa965304ea0ad2ea,
title = "Crystallographic orientation change with line-width for CVD Cu damascene interconnection",
author = "K.Ueno K.Ueno and Y.Tsuchiya Y.Tsuchiya and N.Itoh N.Itoh and T.Kikkawa T.Kikkawa and A.Sekiguchi A.Sekiguchi and Kazuyoshi Ueno",
year = "1997",
month = "10",
day = "1",
language = "English",
pages = "489--494",
journal = "Advanced Metallization and Interconnect Systems for ULSI Applications in 1997",

}

TY - JOUR

T1 - Crystallographic orientation change with line-width for CVD Cu damascene interconnection

AU - K.Ueno, K.Ueno

AU - Y.Tsuchiya, Y.Tsuchiya

AU - N.Itoh, N.Itoh

AU - T.Kikkawa, T.Kikkawa

AU - A.Sekiguchi, A.Sekiguchi

AU - Ueno, Kazuyoshi

PY - 1997/10/1

Y1 - 1997/10/1

M3 - Article

SP - 489

EP - 494

JO - Advanced Metallization and Interconnect Systems for ULSI Applications in 1997

JF - Advanced Metallization and Interconnect Systems for ULSI Applications in 1997

ER -