Crystallographic orientation change with line-width for CVD Cu damascene interconnection

K.Ueno K.Ueno, Y.Tsuchiya Y.Tsuchiya, N.Itoh N.Itoh, T.Kikkawa T.Kikkawa, A.Sekiguchi A.Sekiguchi, Kazuyoshi Ueno

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)489-494
JournalAdvanced Metallization and Interconnect Systems for ULSI Applications in 1997
Publication statusPublished - 1997 Oct 1

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