Curing Reaction of SU-8 Negative-type Photoresist by MeV Ion Beam Lithography

K. Takano, T. Kamiya, M. Sugimoto, S. Seki, T. Satoh, Y. Ishii, T. Ohkubo, M. Koka, H. Nishikawa

Research output: Contribution to journal › Article › peer-review

Original language	English
Journal	27th International Conference of Photopolymer Science and Technology (ICPST-27)
Publication status	Published - 2010 Jun 24

Cite this

@article{c0bad36e4bf74d8483104102f6534292,

title = "Curing Reaction of SU-8 Negative-type Photoresist by MeV Ion Beam Lithography",

author = "K. Takano and T. Kamiya and M. Sugimoto and S. Seki and T. Satoh and Y. Ishii and T. Ohkubo and M. Koka and H. Nishikawa",

year = "2010",

month = jun,

day = "24",

language = "English",

journal = "27th International Conference of Photopolymer Science and Technology (ICPST-27)",

}

TY - JOUR

T1 - Curing Reaction of SU-8 Negative-type Photoresist by MeV Ion Beam Lithography

AU - Takano, K.

AU - Kamiya, T.

AU - Sugimoto, M.

AU - Seki, S.

AU - Satoh, T.

AU - Ishii, Y.

AU - Ohkubo, T.

AU - Koka, M.

AU - Nishikawa, H.

PY - 2010/6/24

Y1 - 2010/6/24

M3 - Article

JO - 27th International Conference of Photopolymer Science and Technology (ICPST-27)

JF - 27th International Conference of Photopolymer Science and Technology (ICPST-27)

ER -