Curing Reaction of SU-8 Negative-type Photoresist by MeV Ion Beam Lithography

K. Takano, T. Kamiya, M. Sugimoto, S. Seki, T. Satoh, Y. Ishii, T. Ohkubo, M. Koka, H. Nishikawa

Research output: Contribution to journalArticle

Original languageEnglish
Journal27th International Conference of Photopolymer Science and Technology (ICPST-27)
Publication statusPublished - 2010 Jun 24

Cite this

Curing Reaction of SU-8 Negative-type Photoresist by MeV Ion Beam Lithography. / Takano, K.; Kamiya, T.; Sugimoto, M.; Seki, S.; Satoh, T.; Ishii, Y.; Ohkubo, T.; Koka, M.; Nishikawa, H.

In: 27th International Conference of Photopolymer Science and Technology (ICPST-27), 24.06.2010.

Research output: Contribution to journalArticle

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title = "Curing Reaction of SU-8 Negative-type Photoresist by MeV Ion Beam Lithography",
author = "K. Takano and T. Kamiya and M. Sugimoto and S. Seki and T. Satoh and Y. Ishii and T. Ohkubo and M. Koka and H. Nishikawa",
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AU - Takano, K.

AU - Kamiya, T.

AU - Sugimoto, M.

AU - Seki, S.

AU - Satoh, T.

AU - Ishii, Y.

AU - Ohkubo, T.

AU - Koka, M.

AU - Nishikawa, H.

PY - 2010/6/24

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