Original language | English |
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Journal | 27th International Conference of Photopolymer Science and Technology (ICPST-27) |
Publication status | Published - 2010 Jun 24 |
Curing Reaction of SU-8 Negative-type Photoresist by MeV Ion Beam Lithography
K. Takano, T. Kamiya, M. Sugimoto, S. Seki, T. Satoh, Y. Ishii, T. Ohkubo, M. Koka, H. Nishikawa
Research output: Contribution to journal › Article › peer-review