Curing Reaction of SU-8 Negative-type Photoresist by MeV Ion Beam Lithography

K. Takano, T. Kamiya, M. Sugimoto, S. Seki, T. Satoh, Y. Ishii, T. Ohkubo, M. Koka, H. Nishikawa

Research output: Contribution to journal › Article

Original languageEnglish
Journal27th International Conference of Photopolymer Science and Technology (ICPST-27)
Publication statusPublished - 2010 Jun 24

Cite this

Curing Reaction of SU-8 Negative-type Photoresist by MeV Ion Beam Lithography. / Takano, K.; Kamiya, T.; Sugimoto, M.; Seki, S.; Satoh, T.; Ishii, Y.; Ohkubo, T.; Koka, M.; Nishikawa, H.

In: 27th International Conference of Photopolymer Science and Technology (ICPST-27), 24.06.2010.

Research output: Contribution to journal › Article

Takano, K, Kamiya, T, Sugimoto, M, Seki, S, Satoh, T, Ishii, Y, Ohkubo, T, Koka, M & Nishikawa, H 2010, 'Curing Reaction of SU-8 Negative-type Photoresist by MeV Ion Beam Lithography', 27th International Conference of Photopolymer Science and Technology (ICPST-27).
Takano K, Kamiya T, Sugimoto M, Seki S, Satoh T, Ishii Y et al. Curing Reaction of SU-8 Negative-type Photoresist by MeV Ion Beam Lithography. 27th International Conference of Photopolymer Science and Technology (ICPST-27). 2010 Jun 24.
Takano, K. ; Kamiya, T. ; Sugimoto, M. ; Seki, S. ; Satoh, T. ; Ishii, Y. ; Ohkubo, T. ; Koka, M. ; Nishikawa, H. / Curing Reaction of SU-8 Negative-type Photoresist by MeV Ion Beam Lithography. In: 27th International Conference of Photopolymer Science and Technology (ICPST-27). 2010.
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AU - Takano, K.

AU - Kamiya, T.

AU - Sugimoto, M.

AU - Seki, S.

AU - Satoh, T.

AU - Ishii, Y.

AU - Ohkubo, T.

AU - Koka, M.

AU - Nishikawa, H.

PY - 2010/6/24

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JF - 27th International Conference of Photopolymer Science and Technology (ICPST-27)

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