Current induced grain growth of electroplated copper film

Liyana Razak, Takamasa Yamaguchi, Seishi Akahori, Hideki Hashimoto, Kazuyoshi Ueno

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

To study the potential of electric current stress in enhancing the grain growth of electroplated copper (Cu) films, the behavior of Cu grain growth at different additive concentrations with current stress applied was investigated. It was found that the lower poly(ethylene glycol) (PEG) concentration alone slightly enhanced the grain growth, but the higher sulfopropyl sulfonate (SPS) concentration was favored in assisting larger grain growth in the current induced grain growth. The effect of current density and temperature on the current induced grain growth have also been studied, and it was found that current stress with a high current density and at a high temperature promotes a larger grain size and anisotropic grain growth along the current direction.

Original languageEnglish
Article number05EA04
JournalJapanese Journal of Applied Physics
Volume51
Issue number5 PART 2
DOIs
Publication statusPublished - 2012 May

Fingerprint

Induced currents
Grain growth
Copper
copper
Polyethylene glycols
Current density
current density
Electric currents
sulfonates
electric current
high current
glycols
ethylene
grain size
Temperature

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Current induced grain growth of electroplated copper film. / Razak, Liyana; Yamaguchi, Takamasa; Akahori, Seishi; Hashimoto, Hideki; Ueno, Kazuyoshi.

In: Japanese Journal of Applied Physics, Vol. 51, No. 5 PART 2, 05EA04, 05.2012.

Research output: Contribution to journalArticle

Razak, Liyana ; Yamaguchi, Takamasa ; Akahori, Seishi ; Hashimoto, Hideki ; Ueno, Kazuyoshi. / Current induced grain growth of electroplated copper film. In: Japanese Journal of Applied Physics. 2012 ; Vol. 51, No. 5 PART 2.
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