Current status of copper multilevel interconnects (Invited)

K.Ueno K.Ueno, M.Iguchi M.Iguchi, T.Yokoyama T.Yokoyama, N.Oda N.Oda, H.Miyamoto H.Miyamoto, Y.Matsubara Y.Matsubara, T.Horiuchi T.Horiuchi, S.Saito S.Saito, Kazuyoshi Ueno

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)1-8
JournalProceedings of 1st International Conference on Semiconductor Technology
Volume2
Publication statusPublished - 2001 Mar 1

Cite this

K.Ueno, K. U., M.Iguchi, M. I., T.Yokoyama, T. Y., N.Oda, N. O., H.Miyamoto, H. M., Y.Matsubara, Y. M., ... Ueno, K. (2001). Current status of copper multilevel interconnects (Invited). Proceedings of 1st International Conference on Semiconductor Technology, 2, 1-8.

Current status of copper multilevel interconnects (Invited). / K.Ueno, K.Ueno; M.Iguchi, M.Iguchi; T.Yokoyama, T.Yokoyama; N.Oda, N.Oda; H.Miyamoto, H.Miyamoto; Y.Matsubara, Y.Matsubara; T.Horiuchi, T.Horiuchi; S.Saito, S.Saito; Ueno, Kazuyoshi.

In: Proceedings of 1st International Conference on Semiconductor Technology, Vol. 2, 01.03.2001, p. 1-8.

Research output: Contribution to journalArticle

K.Ueno, KU, M.Iguchi, MI, T.Yokoyama, TY, N.Oda, NO, H.Miyamoto, HM, Y.Matsubara, YM, T.Horiuchi, TH, S.Saito, SS & Ueno, K 2001, 'Current status of copper multilevel interconnects (Invited)', Proceedings of 1st International Conference on Semiconductor Technology, vol. 2, pp. 1-8.
K.Ueno KU, M.Iguchi MI, T.Yokoyama TY, N.Oda NO, H.Miyamoto HM, Y.Matsubara YM et al. Current status of copper multilevel interconnects (Invited). Proceedings of 1st International Conference on Semiconductor Technology. 2001 Mar 1;2:1-8.
K.Ueno, K.Ueno ; M.Iguchi, M.Iguchi ; T.Yokoyama, T.Yokoyama ; N.Oda, N.Oda ; H.Miyamoto, H.Miyamoto ; Y.Matsubara, Y.Matsubara ; T.Horiuchi, T.Horiuchi ; S.Saito, S.Saito ; Ueno, Kazuyoshi. / Current status of copper multilevel interconnects (Invited). In: Proceedings of 1st International Conference on Semiconductor Technology. 2001 ; Vol. 2. pp. 1-8.
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