Current status of copper multilevel interconnects (Invited)

K.Ueno K.Ueno, M.Iguchi M.Iguchi, T.Yokoyama T.Yokoyama, N.Oda N.Oda, H.Miyamoto H.Miyamoto, Y.Matsubara Y.Matsubara, T.Horiuchi T.Horiuchi, S.Saito S.Saito, Kazuyoshi Ueno

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)1-8
JournalProceedings of 1st International Conference on Semiconductor Technology
Volume2
Publication statusPublished - 2001 Mar 1

Cite this

K.Ueno, K. U., M.Iguchi, M. I., T.Yokoyama, T. Y., N.Oda, N. O., H.Miyamoto, H. M., Y.Matsubara, Y. M., T.Horiuchi, T. H., S.Saito, S. S., & Ueno, K. (2001). Current status of copper multilevel interconnects (Invited). Proceedings of 1st International Conference on Semiconductor Technology, 2, 1-8.