Detection of deposition rate of plasma-polymerized films by quartz crystal microbalance

Shigeru Kurosawa, Tomoya Hirokawa, Kazuya Kashima, Hidenobu Aizawa, Dae Sang Han, Yasuo Yoshimi, Yuji Okada, Kiyoshi Yase, Jun Miyake, Minoru Yoshimoto, Jöns Hilborn

Research output: Contribution to journalArticle

53 Citations (Scopus)

Abstract

The deposition rates of plasma-polymerized (pp-) films of styrene, pentafluorostyrene, allyl alcohol, allylamine, methacrolein, acrolein, and acrylic acid were determined by the quartz crystal microbalance technique. Using the same polymerization conditions (100 W RF and 100 Pa vapor pressure) for the various monomers, it was found that the deposition rates were proportional to the polymerization time. The deposition rates of pp-styrene, pp-pentafluorostyrene, pp-allyl alcohol and pp-allylamine were independent of the position of the lower electrode in the plasma polymerization equipment. In contrast, the deposition rates of pp-methacrolein, pp-acrolein and pp-acrylic acid were scattered. The average deposition rate of pp-allyl alcohol was 0.42 μg/min. The average deposition rate of pp-styrene was higher by eight times, and that of pp-pentafluorostyrene was higher by 388 times than that of pp-allyl alcohol. The average deposition rate depended on the chemical structure of the monomer, giving rise to different mechanisms of polymerization. The deposition rates of monomers containing allylic hydrogens were slow due to radical-radical coupling. These unexpected but significant differences were assumed to have arisen from initiation-controlled free radical polymerization.

Original languageEnglish
Pages (from-to)262-267
Number of pages6
JournalThin Solid Films
Volume374
Issue number2
DOIs
Publication statusPublished - 2000 Oct 17

Fingerprint

Quartz crystal microbalances
quartz crystals
Deposition rates
microbalances
Plasmas
polymerization
Styrene
alcohols
Alcohols
Allylamine
styrenes
Acrolein
monomers
Monomers
Polymerization
acrylic acid
acids
Acrylics
Plasma polymerization
Acids

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Kurosawa, S., Hirokawa, T., Kashima, K., Aizawa, H., Han, D. S., Yoshimi, Y., ... Hilborn, J. (2000). Detection of deposition rate of plasma-polymerized films by quartz crystal microbalance. Thin Solid Films, 374(2), 262-267. https://doi.org/10.1016/S0040-6090(00)01161-5

Detection of deposition rate of plasma-polymerized films by quartz crystal microbalance. / Kurosawa, Shigeru; Hirokawa, Tomoya; Kashima, Kazuya; Aizawa, Hidenobu; Han, Dae Sang; Yoshimi, Yasuo; Okada, Yuji; Yase, Kiyoshi; Miyake, Jun; Yoshimoto, Minoru; Hilborn, Jöns.

In: Thin Solid Films, Vol. 374, No. 2, 17.10.2000, p. 262-267.

Research output: Contribution to journalArticle

Kurosawa, S, Hirokawa, T, Kashima, K, Aizawa, H, Han, DS, Yoshimi, Y, Okada, Y, Yase, K, Miyake, J, Yoshimoto, M & Hilborn, J 2000, 'Detection of deposition rate of plasma-polymerized films by quartz crystal microbalance', Thin Solid Films, vol. 374, no. 2, pp. 262-267. https://doi.org/10.1016/S0040-6090(00)01161-5
Kurosawa, Shigeru ; Hirokawa, Tomoya ; Kashima, Kazuya ; Aizawa, Hidenobu ; Han, Dae Sang ; Yoshimi, Yasuo ; Okada, Yuji ; Yase, Kiyoshi ; Miyake, Jun ; Yoshimoto, Minoru ; Hilborn, Jöns. / Detection of deposition rate of plasma-polymerized films by quartz crystal microbalance. In: Thin Solid Films. 2000 ; Vol. 374, No. 2. pp. 262-267.
@article{6ae71bed917a41edbd715f9158ca8b10,
title = "Detection of deposition rate of plasma-polymerized films by quartz crystal microbalance",
abstract = "The deposition rates of plasma-polymerized (pp-) films of styrene, pentafluorostyrene, allyl alcohol, allylamine, methacrolein, acrolein, and acrylic acid were determined by the quartz crystal microbalance technique. Using the same polymerization conditions (100 W RF and 100 Pa vapor pressure) for the various monomers, it was found that the deposition rates were proportional to the polymerization time. The deposition rates of pp-styrene, pp-pentafluorostyrene, pp-allyl alcohol and pp-allylamine were independent of the position of the lower electrode in the plasma polymerization equipment. In contrast, the deposition rates of pp-methacrolein, pp-acrolein and pp-acrylic acid were scattered. The average deposition rate of pp-allyl alcohol was 0.42 μg/min. The average deposition rate of pp-styrene was higher by eight times, and that of pp-pentafluorostyrene was higher by 388 times than that of pp-allyl alcohol. The average deposition rate depended on the chemical structure of the monomer, giving rise to different mechanisms of polymerization. The deposition rates of monomers containing allylic hydrogens were slow due to radical-radical coupling. These unexpected but significant differences were assumed to have arisen from initiation-controlled free radical polymerization.",
author = "Shigeru Kurosawa and Tomoya Hirokawa and Kazuya Kashima and Hidenobu Aizawa and Han, {Dae Sang} and Yasuo Yoshimi and Yuji Okada and Kiyoshi Yase and Jun Miyake and Minoru Yoshimoto and J{\"o}ns Hilborn",
year = "2000",
month = "10",
day = "17",
doi = "10.1016/S0040-6090(00)01161-5",
language = "English",
volume = "374",
pages = "262--267",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier",
number = "2",

}

TY - JOUR

T1 - Detection of deposition rate of plasma-polymerized films by quartz crystal microbalance

AU - Kurosawa, Shigeru

AU - Hirokawa, Tomoya

AU - Kashima, Kazuya

AU - Aizawa, Hidenobu

AU - Han, Dae Sang

AU - Yoshimi, Yasuo

AU - Okada, Yuji

AU - Yase, Kiyoshi

AU - Miyake, Jun

AU - Yoshimoto, Minoru

AU - Hilborn, Jöns

PY - 2000/10/17

Y1 - 2000/10/17

N2 - The deposition rates of plasma-polymerized (pp-) films of styrene, pentafluorostyrene, allyl alcohol, allylamine, methacrolein, acrolein, and acrylic acid were determined by the quartz crystal microbalance technique. Using the same polymerization conditions (100 W RF and 100 Pa vapor pressure) for the various monomers, it was found that the deposition rates were proportional to the polymerization time. The deposition rates of pp-styrene, pp-pentafluorostyrene, pp-allyl alcohol and pp-allylamine were independent of the position of the lower electrode in the plasma polymerization equipment. In contrast, the deposition rates of pp-methacrolein, pp-acrolein and pp-acrylic acid were scattered. The average deposition rate of pp-allyl alcohol was 0.42 μg/min. The average deposition rate of pp-styrene was higher by eight times, and that of pp-pentafluorostyrene was higher by 388 times than that of pp-allyl alcohol. The average deposition rate depended on the chemical structure of the monomer, giving rise to different mechanisms of polymerization. The deposition rates of monomers containing allylic hydrogens were slow due to radical-radical coupling. These unexpected but significant differences were assumed to have arisen from initiation-controlled free radical polymerization.

AB - The deposition rates of plasma-polymerized (pp-) films of styrene, pentafluorostyrene, allyl alcohol, allylamine, methacrolein, acrolein, and acrylic acid were determined by the quartz crystal microbalance technique. Using the same polymerization conditions (100 W RF and 100 Pa vapor pressure) for the various monomers, it was found that the deposition rates were proportional to the polymerization time. The deposition rates of pp-styrene, pp-pentafluorostyrene, pp-allyl alcohol and pp-allylamine were independent of the position of the lower electrode in the plasma polymerization equipment. In contrast, the deposition rates of pp-methacrolein, pp-acrolein and pp-acrylic acid were scattered. The average deposition rate of pp-allyl alcohol was 0.42 μg/min. The average deposition rate of pp-styrene was higher by eight times, and that of pp-pentafluorostyrene was higher by 388 times than that of pp-allyl alcohol. The average deposition rate depended on the chemical structure of the monomer, giving rise to different mechanisms of polymerization. The deposition rates of monomers containing allylic hydrogens were slow due to radical-radical coupling. These unexpected but significant differences were assumed to have arisen from initiation-controlled free radical polymerization.

UR - http://www.scopus.com/inward/record.url?scp=0034292280&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0034292280&partnerID=8YFLogxK

U2 - 10.1016/S0040-6090(00)01161-5

DO - 10.1016/S0040-6090(00)01161-5

M3 - Article

AN - SCOPUS:0034292280

VL - 374

SP - 262

EP - 267

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

IS - 2

ER -