Abstract
It is considered that particle deposition on the photo mask, such as oil dusts which are generated from mechanical bearings of the spin processors, is one of main causes of the deterioration of pattern preciseness. In our R & D, application of magnetic levitation utilizing bulk HTSs to the spin processors for the photo mask production has been proposed. In this study, we try to develop a new model apparatus demonstrating non-contact spinning clean-up processor in photo mask production system. The levitation and rotation test by using this model apparatus showed that this new model apparatus accomplished the remarkable improvement of the levitation and the rotation ability. This paper describes the levitation and rotation test results of the new model spinner comparing with those obtained in our previous study.
| Original language | English |
|---|---|
| Article number | 5617305 |
| Pages (from-to) | 2241-2244 |
| Number of pages | 4 |
| Journal | IEEE Transactions on Applied Superconductivity |
| Volume | 21 |
| Issue number | 3 PART 2 |
| DOIs | |
| Publication status | Published - 2011 Jun 1 |
| Externally published | Yes |
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Keywords
- Bulk HTS
- Magnetic levitation
- Spin processor
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering
Cite this
Development and test of model apparatus utilizing HTS magnetic levitation for non-contact spinning clean-up processors of photo mask production. / Saito, Kimiyo; Fukui, Satoshi; Ogawa, Jun; Oka, Tetsuo; Sato, Takao; Sorimachi, Satoshi; Miyazaki, Shinsuke.
In: IEEE Transactions on Applied Superconductivity, Vol. 21, No. 3 PART 2, 5617305, 01.06.2011, p. 2241-2244.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Development and test of model apparatus utilizing HTS magnetic levitation for non-contact spinning clean-up processors of photo mask production
AU - Saito, Kimiyo
AU - Fukui, Satoshi
AU - Ogawa, Jun
AU - Oka, Tetsuo
AU - Sato, Takao
AU - Sorimachi, Satoshi
AU - Miyazaki, Shinsuke
PY - 2011/6/1
Y1 - 2011/6/1
N2 - It is considered that particle deposition on the photo mask, such as oil dusts which are generated from mechanical bearings of the spin processors, is one of main causes of the deterioration of pattern preciseness. In our R & D, application of magnetic levitation utilizing bulk HTSs to the spin processors for the photo mask production has been proposed. In this study, we try to develop a new model apparatus demonstrating non-contact spinning clean-up processor in photo mask production system. The levitation and rotation test by using this model apparatus showed that this new model apparatus accomplished the remarkable improvement of the levitation and the rotation ability. This paper describes the levitation and rotation test results of the new model spinner comparing with those obtained in our previous study.
AB - It is considered that particle deposition on the photo mask, such as oil dusts which are generated from mechanical bearings of the spin processors, is one of main causes of the deterioration of pattern preciseness. In our R & D, application of magnetic levitation utilizing bulk HTSs to the spin processors for the photo mask production has been proposed. In this study, we try to develop a new model apparatus demonstrating non-contact spinning clean-up processor in photo mask production system. The levitation and rotation test by using this model apparatus showed that this new model apparatus accomplished the remarkable improvement of the levitation and the rotation ability. This paper describes the levitation and rotation test results of the new model spinner comparing with those obtained in our previous study.
KW - Bulk HTS
KW - Magnetic levitation
KW - Spin processor
UR - http://www.scopus.com/inward/record.url?scp=79957917675&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=79957917675&partnerID=8YFLogxK
U2 - 10.1109/TASC.2010.2081655
DO - 10.1109/TASC.2010.2081655
M3 - Article
VL - 21
SP - 2241
EP - 2244
JO - IEEE Transactions on Applied Superconductivity
JF - IEEE Transactions on Applied Superconductivity
SN - 1051-8223
IS - 3 PART 2
M1 - 5617305
ER -