Development and test of model apparatus utilizing HTS magnetic levitation for non-contact spinning clean-up processors of photo mask production

Kimiyo Saito; Satoshi Fukui; Jun Ogawa; Tetsuo Oka; Takao Sato; Satoshi Sorimachi; Shinsuke Miyazaki

doi:10.1109/TASC.2010.2081655

Development and test of model apparatus utilizing HTS magnetic levitation for non-contact spinning clean-up processors of photo mask production

Kimiyo Saito, Satoshi Fukui, Jun Ogawa, Tetsuo Oka, Takao Sato, Satoshi Sorimachi, Shinsuke Miyazaki

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

It is considered that particle deposition on the photo mask, such as oil dusts which are generated from mechanical bearings of the spin processors, is one of main causes of the deterioration of pattern preciseness. In our R & D, application of magnetic levitation utilizing bulk HTSs to the spin processors for the photo mask production has been proposed. In this study, we try to develop a new model apparatus demonstrating non-contact spinning clean-up processor in photo mask production system. The levitation and rotation test by using this model apparatus showed that this new model apparatus accomplished the remarkable improvement of the levitation and the rotation ability. This paper describes the levitation and rotation test results of the new model spinner comparing with those obtained in our previous study.

Original language	English
Article number	5617305
Pages (from-to)	2241-2244
Number of pages	4
Journal	IEEE Transactions on Applied Superconductivity
Volume	21
Issue number	3 PART 2
DOIs	https://doi.org/10.1109/TASC.2010.2081655
Publication status	Published - 2011 Jun 1
Externally published	Yes

Keywords

Bulk HTS
Magnetic levitation
Spin processor

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Electrical and Electronic Engineering

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Development and test of model apparatus utilizing HTS magnetic levitation for non-contact spinning clean-up processors of photo mask production. / Saito, Kimiyo; Fukui, Satoshi; Ogawa, Jun; Oka, Tetsuo; Sato, Takao; Sorimachi, Satoshi; Miyazaki, Shinsuke.

In: IEEE Transactions on Applied Superconductivity, Vol. 21, No. 3 PART 2, 5617305, 01.06.2011, p. 2241-2244.

Research output: Contribution to journal › Article › peer-review

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