TY - JOUR
T1 - Development of a 17×17 parallel electron beam lithography system
AU - Miyaguchi, Hiroshi
AU - Muroyama, Masanori
AU - Yoshida, Shinya
AU - Ikegami, Naokatsu
AU - Kojima, Akira
AU - Tanaka, Shuji
AU - Esashi, Masayoshi
N1 - Publisher Copyright:
© 2016 The Institute of Electrical Engineers of Japan.
PY - 2016
Y1 - 2016
N2 - The 17× 17 parallel electron beam lithography system has been implemented and evaluated to clarify its system problems and to accelerate a 100× 100 massive parallel electron beam direct draw system under development. This paper describes its system concept, an electron emitter driver circuit, its control system and an exposure result.
AB - The 17× 17 parallel electron beam lithography system has been implemented and evaluated to clarify its system problems and to accelerate a 100× 100 massive parallel electron beam direct draw system under development. This paper describes its system concept, an electron emitter driver circuit, its control system and an exposure result.
KW - Aberration correction
KW - Nc-si
KW - Parallel electron beam lithography
KW - Reduction projection
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U2 - 10.1541/ieejsmas.136.413
DO - 10.1541/ieejsmas.136.413
M3 - Article
AN - SCOPUS:84985036821
VL - 136
SP - 413
EP - 419
JO - IEEJ Transactions on Sensors and Micromachines
JF - IEEJ Transactions on Sensors and Micromachines
SN - 1341-8939
IS - 9
ER -