Abstract
A compact angle-resolved secondary ion mass spectrometer with a special geometrical configuration, composing of a differentially pumped micro-beam ion gun, a tiltable sample stage and a time-of-flight (TOF) mass spectrometer, was newly developed. This system enables the measurement of angular distribution (AD) of secondary ions, which are ejected by oblique Ar+ sputtering, by a simple tilt operation of the sample stage for ejection angles ranging from 0° to 60° with keeping the ion incidence angle constant 62°±2° from the normal to the surface. Using this system, AD of secondary ions from an HfN film by 3 keV Ar+-ion bombardment was measured at room temperature. Since the yield of HfN+ dimer ions was almost independent of Hf+ and N+ monomer ions, it was concluded that the HfN+ dimer ions were generated via the "as such" direct emission process.
Original language | English |
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Pages (from-to) | 768-770 |
Number of pages | 3 |
Journal | Vacuum |
Volume | 80 |
Issue number | 7 SPEC. ISS. |
DOIs | |
Publication status | Published - 2006 May 31 |
Keywords
- Angular distribution
- Cluster
- Hafnium
- Nitride
- Secondary ion mass spectrometer
- Sputtering
ASJC Scopus subject areas
- Instrumentation
- Condensed Matter Physics
- Surfaces, Coatings and Films