Development of a compact angle-resolved secondary ion mass spectrometer for Ar+ sputtering

Shinichi Kawaguchi, Masaki Tanemura, Masato Kudo, Nobumasa Handa, Naokazu Kinoshita, Lei Miao, Sakae Tanemura, Yasuhito Gotoh, Meiyong Liao, Satoko Shinkai

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

A compact angle-resolved secondary ion mass spectrometer with a special geometrical configuration, composing of a differentially pumped micro-beam ion gun, a tiltable sample stage and a time-of-flight (TOF) mass spectrometer, was newly developed. This system enables the measurement of angular distribution (AD) of secondary ions, which are ejected by oblique Ar+ sputtering, by a simple tilt operation of the sample stage for ejection angles ranging from 0° to 60° with keeping the ion incidence angle constant 62°±2° from the normal to the surface. Using this system, AD of secondary ions from an HfN film by 3 keV Ar+-ion bombardment was measured at room temperature. Since the yield of HfN+ dimer ions was almost independent of Hf+ and N+ monomer ions, it was concluded that the HfN+ dimer ions were generated via the "as such" direct emission process.

Original languageEnglish
Pages (from-to)768-770
Number of pages3
JournalVacuum
Volume80
Issue number7 SPEC. ISS.
DOIs
Publication statusPublished - 2006 May 31
Externally publishedYes

Keywords

  • Angular distribution
  • Cluster
  • Hafnium
  • Nitride
  • Secondary ion mass spectrometer
  • Sputtering

ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

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  • Cite this

    Kawaguchi, S., Tanemura, M., Kudo, M., Handa, N., Kinoshita, N., Miao, L., Tanemura, S., Gotoh, Y., Liao, M., & Shinkai, S. (2006). Development of a compact angle-resolved secondary ion mass spectrometer for Ar+ sputtering. Vacuum, 80(7 SPEC. ISS.), 768-770. https://doi.org/10.1016/j.vacuum.2005.11.016