Development of micromachining technology in ion microbeam system at TIARA, JAEA

T. Kamiya, Hiroyuki Nishikawa, T. Satoh, J. Haga, M. Oikawa, Y. Ishii, T. Ohkubo, N. Uchiya, Y. Furuta

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

An ion-beam-lithography technique has been progressed in the microbeam systems at Japan Atomic Energy Agency (JAEA) Takasaki. In order to obtain a high-precision measure for microbeam size estimation with a high precision, we applied this technique combined with the electroplating process to make a Ni relief pattern as a resolution standard used in secondary electron imaging. As a result, the smallest beam size could be recorded. The scattering of ions in the materials influenced the spatial resolution and this is also discussed.

Original languageEnglish
Pages (from-to)488-491
Number of pages4
JournalApplied Radiation and Isotopes
Volume67
Issue number3
DOIs
Publication statusPublished - 2009 Mar

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Keywords

  • Beam size measurement
  • Electroplating
  • Ion microbeam
  • Ion-beam lithography

ASJC Scopus subject areas

  • Radiation

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