Development of micromachining technology in ion microbeam system at TIARA, JAEA

T. Kamiya; H. Nishikawa; T. Satoh; J. Haga; M. Oikawa; Y. Ishii; T. Ohkubo; N. Uchiya; Y. Furuta

doi:10.1016/j.apradiso.2008.06.021

Development of micromachining technology in ion microbeam system at TIARA, JAEA

T. Kamiya, H. Nishikawa, T. Satoh, J. Haga, M. Oikawa, Y. Ishii, T. Ohkubo, N. Uchiya, Y. Furuta

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

An ion-beam-lithography technique has been progressed in the microbeam systems at Japan Atomic Energy Agency (JAEA) Takasaki. In order to obtain a high-precision measure for microbeam size estimation with a high precision, we applied this technique combined with the electroplating process to make a Ni relief pattern as a resolution standard used in secondary electron imaging. As a result, the smallest beam size could be recorded. The scattering of ions in the materials influenced the spatial resolution and this is also discussed.

Original language	English
Pages (from-to)	488-491
Number of pages	4
Journal	Applied Radiation and Isotopes
Volume	67
Issue number	3
DOIs	https://doi.org/10.1016/j.apradiso.2008.06.021
Publication status	Published - 2009 Mar

Keywords

Beam size measurement
Electroplating
Ion microbeam
Ion-beam lithography

ASJC Scopus subject areas

Radiation

Access to Document

10.1016/j.apradiso.2008.06.021

Cite this

@article{0681a6b882494d778a614f29d285afcf,

title = "Development of micromachining technology in ion microbeam system at TIARA, JAEA",

abstract = "An ion-beam-lithography technique has been progressed in the microbeam systems at Japan Atomic Energy Agency (JAEA) Takasaki. In order to obtain a high-precision measure for microbeam size estimation with a high precision, we applied this technique combined with the electroplating process to make a Ni relief pattern as a resolution standard used in secondary electron imaging. As a result, the smallest beam size could be recorded. The scattering of ions in the materials influenced the spatial resolution and this is also discussed.",

keywords = "Beam size measurement, Electroplating, Ion microbeam, Ion-beam lithography",

author = "T. Kamiya and H. Nishikawa and T. Satoh and J. Haga and M. Oikawa and Y. Ishii and T. Ohkubo and N. Uchiya and Y. Furuta",

note = "Funding Information: The authors would like to express their appreciation for the great cooperation obtained from all of the accelerator staff in TIARA in carrying out the present experiments. This research was partially supported by the Ministry of Education, Science, Sports and Culture, Grant-in-Aid for Scientific Research (A), 19206105, 2007, and Scientific Research (B), 17310085, 2007, and also partially by funds for 21st Century COE Program (Gunma Univ.).",

year = "2009",

month = mar,

doi = "10.1016/j.apradiso.2008.06.021",

language = "English",

volume = "67",

pages = "488--491",

journal = "Applied Radiation and Isotopes",

issn = "0969-8043",

publisher = "Elsevier Limited",

number = "3",

}

TY - JOUR

T1 - Development of micromachining technology in ion microbeam system at TIARA, JAEA

AU - Kamiya, T.

AU - Nishikawa, H.

AU - Satoh, T.

AU - Haga, J.

AU - Oikawa, M.

AU - Ishii, Y.

AU - Ohkubo, T.

AU - Uchiya, N.

AU - Furuta, Y.

N1 - Funding Information: The authors would like to express their appreciation for the great cooperation obtained from all of the accelerator staff in TIARA in carrying out the present experiments. This research was partially supported by the Ministry of Education, Science, Sports and Culture, Grant-in-Aid for Scientific Research (A), 19206105, 2007, and Scientific Research (B), 17310085, 2007, and also partially by funds for 21st Century COE Program (Gunma Univ.).

PY - 2009/3

Y1 - 2009/3

N2 - An ion-beam-lithography technique has been progressed in the microbeam systems at Japan Atomic Energy Agency (JAEA) Takasaki. In order to obtain a high-precision measure for microbeam size estimation with a high precision, we applied this technique combined with the electroplating process to make a Ni relief pattern as a resolution standard used in secondary electron imaging. As a result, the smallest beam size could be recorded. The scattering of ions in the materials influenced the spatial resolution and this is also discussed.

AB - An ion-beam-lithography technique has been progressed in the microbeam systems at Japan Atomic Energy Agency (JAEA) Takasaki. In order to obtain a high-precision measure for microbeam size estimation with a high precision, we applied this technique combined with the electroplating process to make a Ni relief pattern as a resolution standard used in secondary electron imaging. As a result, the smallest beam size could be recorded. The scattering of ions in the materials influenced the spatial resolution and this is also discussed.

KW - Beam size measurement

KW - Electroplating

KW - Ion microbeam

KW - Ion-beam lithography

UR - http://www.scopus.com/inward/record.url?scp=58549090097&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=58549090097&partnerID=8YFLogxK

U2 - 10.1016/j.apradiso.2008.06.021

DO - 10.1016/j.apradiso.2008.06.021

M3 - Article

C2 - 18674918

AN - SCOPUS:58549090097

SN - 0969-8043

VL - 67

SP - 488

EP - 491

JO - Applied Radiation and Isotopes

JF - Applied Radiation and Isotopes

IS - 3

ER -

Development of micromachining technology in ion microbeam system at TIARA, JAEA

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this