Development of rf/dc plasma systems for nitriding of aluminum alloys

Yoshio SUgita, Tatsuhiko Aizawa

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)47-48
JournalAbstract of ICMCTF-2011
Volume1
Publication statusPublished - 2011 Apr 27

Cite this

Development of rf/dc plasma systems for nitriding of aluminum alloys. / SUgita, Yoshio; Aizawa, Tatsuhiko.

In: Abstract of ICMCTF-2011, Vol. 1, 27.04.2011, p. 47-48.

Research output: Contribution to journalArticle

SUgita, Yoshio ; Aizawa, Tatsuhiko. / Development of rf/dc plasma systems for nitriding of aluminum alloys. In: Abstract of ICMCTF-2011. 2011 ; Vol. 1. pp. 47-48.
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