EBSD analysis of electroplated magnetite thin films

Anjela Dimitrova Koblischka-Veneva, Michael Rudolf Koblischka, C. L. Teng, M. P. Ryan, U. Hartmann, F. Mücklich

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

By means of electron backscatter diffraction (EBSD), we analyse the crystallographic orientation of electroplated magnetite thin films on Si/copper substrates. Varying the voltage during the electroplating procedure, the resulting surface properties are differing considerably. While a high voltage produces larger but individual grains on the surface, the surfaces become smoother on decreasing voltage. Good quality Kikuchi patterns could be obtained from all samples; even on individual grains, where the surface and the edges could be measured. The spatial resolution of the EBSD measurement could be increased to about 10 nm; thus enabling a detailed analysis of single magnetite grains. The thin film samples are polycrystalline and do not exhibit a preferred orientation. EBSD reveals that the grain size changes depending on the processing conditions, while the detected misorientation angles stay similar.

Original languageEnglish
Pages (from-to)1235-1238
Number of pages4
JournalJournal of Magnetism and Magnetic Materials
Volume322
Issue number9-12
DOIs
Publication statusPublished - 2010 May 1
Externally publishedYes

Fingerprint

Ferrosoferric Oxide
Magnetite
Electron diffraction
magnetite
Thin films
Electric potential
thin films
diffraction
electrons
electroplating
electric potential
Electroplating
guy wires
misalignment
surface properties
Surface properties
Copper
high voltages
spatial resolution
grain size

Keywords

  • EBSD
  • Grain orientation
  • Magnetite

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

EBSD analysis of electroplated magnetite thin films. / Koblischka-Veneva, Anjela Dimitrova; Koblischka, Michael Rudolf; Teng, C. L.; Ryan, M. P.; Hartmann, U.; Mücklich, F.

In: Journal of Magnetism and Magnetic Materials, Vol. 322, No. 9-12, 01.05.2010, p. 1235-1238.

Research output: Contribution to journalArticle

Koblischka-Veneva, Anjela Dimitrova ; Koblischka, Michael Rudolf ; Teng, C. L. ; Ryan, M. P. ; Hartmann, U. ; Mücklich, F. / EBSD analysis of electroplated magnetite thin films. In: Journal of Magnetism and Magnetic Materials. 2010 ; Vol. 322, No. 9-12. pp. 1235-1238.
@article{1a4fec9f4cd34ba19511264dc9761bfa,
title = "EBSD analysis of electroplated magnetite thin films",
abstract = "By means of electron backscatter diffraction (EBSD), we analyse the crystallographic orientation of electroplated magnetite thin films on Si/copper substrates. Varying the voltage during the electroplating procedure, the resulting surface properties are differing considerably. While a high voltage produces larger but individual grains on the surface, the surfaces become smoother on decreasing voltage. Good quality Kikuchi patterns could be obtained from all samples; even on individual grains, where the surface and the edges could be measured. The spatial resolution of the EBSD measurement could be increased to about 10 nm; thus enabling a detailed analysis of single magnetite grains. The thin film samples are polycrystalline and do not exhibit a preferred orientation. EBSD reveals that the grain size changes depending on the processing conditions, while the detected misorientation angles stay similar.",
keywords = "EBSD, Grain orientation, Magnetite",
author = "Koblischka-Veneva, {Anjela Dimitrova} and Koblischka, {Michael Rudolf} and Teng, {C. L.} and Ryan, {M. P.} and U. Hartmann and F. M{\"u}cklich",
year = "2010",
month = "5",
day = "1",
doi = "10.1016/j.jmmm.2009.03.028",
language = "English",
volume = "322",
pages = "1235--1238",
journal = "Journal of Magnetism and Magnetic Materials",
issn = "0304-8853",
publisher = "Elsevier",
number = "9-12",

}

TY - JOUR

T1 - EBSD analysis of electroplated magnetite thin films

AU - Koblischka-Veneva, Anjela Dimitrova

AU - Koblischka, Michael Rudolf

AU - Teng, C. L.

AU - Ryan, M. P.

AU - Hartmann, U.

AU - Mücklich, F.

PY - 2010/5/1

Y1 - 2010/5/1

N2 - By means of electron backscatter diffraction (EBSD), we analyse the crystallographic orientation of electroplated magnetite thin films on Si/copper substrates. Varying the voltage during the electroplating procedure, the resulting surface properties are differing considerably. While a high voltage produces larger but individual grains on the surface, the surfaces become smoother on decreasing voltage. Good quality Kikuchi patterns could be obtained from all samples; even on individual grains, where the surface and the edges could be measured. The spatial resolution of the EBSD measurement could be increased to about 10 nm; thus enabling a detailed analysis of single magnetite grains. The thin film samples are polycrystalline and do not exhibit a preferred orientation. EBSD reveals that the grain size changes depending on the processing conditions, while the detected misorientation angles stay similar.

AB - By means of electron backscatter diffraction (EBSD), we analyse the crystallographic orientation of electroplated magnetite thin films on Si/copper substrates. Varying the voltage during the electroplating procedure, the resulting surface properties are differing considerably. While a high voltage produces larger but individual grains on the surface, the surfaces become smoother on decreasing voltage. Good quality Kikuchi patterns could be obtained from all samples; even on individual grains, where the surface and the edges could be measured. The spatial resolution of the EBSD measurement could be increased to about 10 nm; thus enabling a detailed analysis of single magnetite grains. The thin film samples are polycrystalline and do not exhibit a preferred orientation. EBSD reveals that the grain size changes depending on the processing conditions, while the detected misorientation angles stay similar.

KW - EBSD

KW - Grain orientation

KW - Magnetite

UR - http://www.scopus.com/inward/record.url?scp=77949287725&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77949287725&partnerID=8YFLogxK

U2 - 10.1016/j.jmmm.2009.03.028

DO - 10.1016/j.jmmm.2009.03.028

M3 - Article

VL - 322

SP - 1235

EP - 1238

JO - Journal of Magnetism and Magnetic Materials

JF - Journal of Magnetism and Magnetic Materials

SN - 0304-8853

IS - 9-12

ER -