Abstract
The effects of dynamic precursor gas pressure on growth behavior of amorphous Si-C-O nanorods and electron beam scanned speed by electron beam-induced deposition (EBID) process were investigated. The EBID experiment was carried out in a 30 kV field emission gun scanning electron microscope, where the electron beam current was about 0.8 nA with a beam diameter of 4 nm. A 300 kV JEM-3000F field-emission gun transmission electron microscope, attached with a post-column Gatan imaging filter and CCD camera, was employed to characterize the deposits by a high-resolution transmission electron microscopy (HRTEM) and energy-filtered transmission electron microscopy (EFTEM). Experimental investigation showed that the nanorod width remains constant with the dynamic reduction of precursor gas pressure.
| Original language | English |
|---|---|
| Pages (from-to) | 2069-2071 |
| Number of pages | 3 |
| Journal | Journal of Materials Science |
| Volume | 43 |
| Issue number | 6 |
| DOIs | |
| Publication status | Published - 2008 Mar |
| Externally published | Yes |
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ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
Cite this
Effect of dynamic precursor gas pressure on growth behavior of amorphous Si-C-O nanorods by electron beam-induced deposition. / Zhang, Wei; Shimojo, Masayuki; Furuya, Kazuo.
In: Journal of Materials Science, Vol. 43, No. 6, 03.2008, p. 2069-2071.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Effect of dynamic precursor gas pressure on growth behavior of amorphous Si-C-O nanorods by electron beam-induced deposition
AU - Zhang, Wei
AU - Shimojo, Masayuki
AU - Furuya, Kazuo
PY - 2008/3
Y1 - 2008/3
N2 - The effects of dynamic precursor gas pressure on growth behavior of amorphous Si-C-O nanorods and electron beam scanned speed by electron beam-induced deposition (EBID) process were investigated. The EBID experiment was carried out in a 30 kV field emission gun scanning electron microscope, where the electron beam current was about 0.8 nA with a beam diameter of 4 nm. A 300 kV JEM-3000F field-emission gun transmission electron microscope, attached with a post-column Gatan imaging filter and CCD camera, was employed to characterize the deposits by a high-resolution transmission electron microscopy (HRTEM) and energy-filtered transmission electron microscopy (EFTEM). Experimental investigation showed that the nanorod width remains constant with the dynamic reduction of precursor gas pressure.
AB - The effects of dynamic precursor gas pressure on growth behavior of amorphous Si-C-O nanorods and electron beam scanned speed by electron beam-induced deposition (EBID) process were investigated. The EBID experiment was carried out in a 30 kV field emission gun scanning electron microscope, where the electron beam current was about 0.8 nA with a beam diameter of 4 nm. A 300 kV JEM-3000F field-emission gun transmission electron microscope, attached with a post-column Gatan imaging filter and CCD camera, was employed to characterize the deposits by a high-resolution transmission electron microscopy (HRTEM) and energy-filtered transmission electron microscopy (EFTEM). Experimental investigation showed that the nanorod width remains constant with the dynamic reduction of precursor gas pressure.
UR - http://www.scopus.com/inward/record.url?scp=39149115376&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=39149115376&partnerID=8YFLogxK
U2 - 10.1007/s10853-008-2445-0
DO - 10.1007/s10853-008-2445-0
M3 - Article
AN - SCOPUS:39149115376
VL - 43
SP - 2069
EP - 2071
JO - Journal of Materials Science
JF - Journal of Materials Science
SN - 0022-2461
IS - 6
ER -