Effect of dynamic precursor gas pressure on growth behavior of amorphous Si-C-O nanorods by electron beam-induced deposition

Wei Zhang; Massayuki Shimojo; Kazuo Furuya

doi:10.1007/s10853-008-2445-0

Effect of dynamic precursor gas pressure on growth behavior of amorphous Si-C-O nanorods by electron beam-induced deposition

Wei Zhang, Massayuki Shimojo, Kazuo Furuya

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

The effects of dynamic precursor gas pressure on growth behavior of amorphous Si-C-O nanorods and electron beam scanned speed by electron beam-induced deposition (EBID) process were investigated. The EBID experiment was carried out in a 30 kV field emission gun scanning electron microscope, where the electron beam current was about 0.8 nA with a beam diameter of 4 nm. A 300 kV JEM-3000F field-emission gun transmission electron microscope, attached with a post-column Gatan imaging filter and CCD camera, was employed to characterize the deposits by a high-resolution transmission electron microscopy (HRTEM) and energy-filtered transmission electron microscopy (EFTEM). Experimental investigation showed that the nanorod width remains constant with the dynamic reduction of precursor gas pressure.

Original language	English
Pages (from-to)	2069-2071
Number of pages	3
Journal	Journal of Materials Science
Volume	43
Issue number	6
DOIs	https://doi.org/10.1007/s10853-008-2445-0
Publication status	Published - 2008 Mar 1
Externally published	Yes

ASJC Scopus subject areas

Materials Science(all)
Mechanics of Materials
Mechanical Engineering

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title = "Effect of dynamic precursor gas pressure on growth behavior of amorphous Si-C-O nanorods by electron beam-induced deposition",

abstract = "The effects of dynamic precursor gas pressure on growth behavior of amorphous Si-C-O nanorods and electron beam scanned speed by electron beam-induced deposition (EBID) process were investigated. The EBID experiment was carried out in a 30 kV field emission gun scanning electron microscope, where the electron beam current was about 0.8 nA with a beam diameter of 4 nm. A 300 kV JEM-3000F field-emission gun transmission electron microscope, attached with a post-column Gatan imaging filter and CCD camera, was employed to characterize the deposits by a high-resolution transmission electron microscopy (HRTEM) and energy-filtered transmission electron microscopy (EFTEM). Experimental investigation showed that the nanorod width remains constant with the dynamic reduction of precursor gas pressure.",

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T1 - Effect of dynamic precursor gas pressure on growth behavior of amorphous Si-C-O nanorods by electron beam-induced deposition

AU - Zhang, Wei

AU - Shimojo, Massayuki

AU - Furuya, Kazuo

PY - 2008/3/1

Y1 - 2008/3/1

N2 - The effects of dynamic precursor gas pressure on growth behavior of amorphous Si-C-O nanorods and electron beam scanned speed by electron beam-induced deposition (EBID) process were investigated. The EBID experiment was carried out in a 30 kV field emission gun scanning electron microscope, where the electron beam current was about 0.8 nA with a beam diameter of 4 nm. A 300 kV JEM-3000F field-emission gun transmission electron microscope, attached with a post-column Gatan imaging filter and CCD camera, was employed to characterize the deposits by a high-resolution transmission electron microscopy (HRTEM) and energy-filtered transmission electron microscopy (EFTEM). Experimental investigation showed that the nanorod width remains constant with the dynamic reduction of precursor gas pressure.

AB - The effects of dynamic precursor gas pressure on growth behavior of amorphous Si-C-O nanorods and electron beam scanned speed by electron beam-induced deposition (EBID) process were investigated. The EBID experiment was carried out in a 30 kV field emission gun scanning electron microscope, where the electron beam current was about 0.8 nA with a beam diameter of 4 nm. A 300 kV JEM-3000F field-emission gun transmission electron microscope, attached with a post-column Gatan imaging filter and CCD camera, was employed to characterize the deposits by a high-resolution transmission electron microscopy (HRTEM) and energy-filtered transmission electron microscopy (EFTEM). Experimental investigation showed that the nanorod width remains constant with the dynamic reduction of precursor gas pressure.

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Effect of dynamic precursor gas pressure on growth behavior of amorphous Si-C-O nanorods by electron beam-induced deposition

Abstract

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