Effect of high-temperature treatment on optical-absorption bands in amorphous SiO2

N. Dohguchi, S. Munekuni, H. Nishikawa, Y. Ohki, K. Nagasawa

Research output: Contribution to journalArticle

3 Citations (Scopus)
Original languageEnglish
Pages (from-to)2788-2790
JournalJournal of Applied Physics
Volume70
Publication statusPublished - 1991 Sep 1

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