Effect of implanted ion species on the decay of 2.7 eV photoluminescence in thermal

K. S. Seol, Y. Ohki, H. Nishikawa, M. Takiyama, Y. Hama

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)6444-6447
JournalJournal of Applied Physics
Volume80
Publication statusPublished - 1996 Dec 1

Cite this

Effect of implanted ion species on the decay of 2.7 eV photoluminescence in thermal. / Seol, K. S.; Ohki, Y.; Nishikawa, H.; Takiyama, M.; Hama, Y.

In: Journal of Applied Physics, Vol. 80, 01.12.1996, p. 6444-6447.

Research output: Contribution to journalArticle

Seol, K. S. ; Ohki, Y. ; Nishikawa, H. ; Takiyama, M. ; Hama, Y. / Effect of implanted ion species on the decay of 2.7 eV photoluminescence in thermal. In: Journal of Applied Physics. 1996 ; Vol. 80. pp. 6444-6447.
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