Effect of nanometer-scale phase separation on wetting of binary self-assembled thiol monolayers on Au(111)

Shinichiro Imabayashi, Narutoshi Gon, Takayuki Sasaki, Daisuke Hobara, Takashi Kakiuchi

Research output: Contribution to journalArticle

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Abstract

The advancing contact angle of water has been measured on three types of the binary self-assembled monolayers (SAMs) on Au(111) with known surface structure at nanometer scale: a homogeneously mixed SAM of undecanethiol (UDT) and 11-mercaptoundecanoic acid (MUDA) (1), a SAM of hexadecanethiol (HDT) and 3-mercaptopropionic acid (MPA) phase-separated into nanometer-scale domains with different heights (2), and a SAM of UDT and MUDA artificially phase-separated into nanometer-scale domains having approximately equal heights (3). The homogeneously mixed SAM, 1, shows a linear variation of the cosine of the contact angle, cos θ, with the surface mole fraction of COOH-terminated thiol, xsurfCOOH, while in the case of 2 the cos θ versus xsurfCOOH plot is strongly concave; the cos θ depends little on xsurfCOOH for xsurfCOOH < 0.5 and abruptly increases with xsurfCOOH for xsurfCOOH > 0.5. In contrast, the phase-separated SAM, 3, shows a linear variation of cos θ with xsurfCOOH, as is the case of 1, indicating that the contact angle does not reflect the phase separation in nanometer scale. The difference in the height of the domains of the two thiols is the primary factor for the nonlinear cos θ versus xsurfCOOH plot for 2. The Young-Laplace equation explains the nonwetting of the lower domains of 2.

Original languageEnglish
Pages (from-to)2348-2351
Number of pages4
JournalLangmuir
Volume14
Issue number9
Publication statusPublished - 1998 Apr 28
Externally publishedYes

Fingerprint

Self assembled monolayers
Sulfhydryl Compounds
thiols
Phase separation
wetting
Wetting
acids
Contact angle
plots
Laplace equation
Acids
3-Mercaptopropionic Acid
Surface structure
water
Water

ASJC Scopus subject areas

  • Colloid and Surface Chemistry
  • Physical and Theoretical Chemistry

Cite this

Effect of nanometer-scale phase separation on wetting of binary self-assembled thiol monolayers on Au(111). / Imabayashi, Shinichiro; Gon, Narutoshi; Sasaki, Takayuki; Hobara, Daisuke; Kakiuchi, Takashi.

In: Langmuir, Vol. 14, No. 9, 28.04.1998, p. 2348-2351.

Research output: Contribution to journalArticle

Imabayashi, S, Gon, N, Sasaki, T, Hobara, D & Kakiuchi, T 1998, 'Effect of nanometer-scale phase separation on wetting of binary self-assembled thiol monolayers on Au(111)', Langmuir, vol. 14, no. 9, pp. 2348-2351.
Imabayashi, Shinichiro ; Gon, Narutoshi ; Sasaki, Takayuki ; Hobara, Daisuke ; Kakiuchi, Takashi. / Effect of nanometer-scale phase separation on wetting of binary self-assembled thiol monolayers on Au(111). In: Langmuir. 1998 ; Vol. 14, No. 9. pp. 2348-2351.
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