Effect of residual OH impurities in ALD high-k films on interfacial SiO2 growth

S.Kimura S.Kimura, K.Iwamoto K.Iwamoto, M.Kadoshima M.Kadoshima, Y.Nunoshige Y.Nunoshige, A.Ogawa A.Ogawa, T.Nabatame T.Nabatame, H.Ohta H.Ohta, A.Toriumi A.Toriumi, T.Ohishi T.Ohishi, Tomoji Oishi

Research output: Contribution to journalArticle

Original languageEnglish
Journal2006 International Workshop on Dielectric Thin Films for Future ULSI Devices-Science and Technology
Publication statusPublished - 2006 Nov 8

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Effect of residual OH impurities in ALD high-k films on interfacial SiO2 growth. / S.Kimura, S.Kimura; K.Iwamoto, K.Iwamoto; M.Kadoshima, M.Kadoshima; Y.Nunoshige, Y.Nunoshige; A.Ogawa, A.Ogawa; T.Nabatame, T.Nabatame; H.Ohta, H.Ohta; A.Toriumi, A.Toriumi; T.Ohishi, T.Ohishi; Oishi, Tomoji.

In: 2006 International Workshop on Dielectric Thin Films for Future ULSI Devices-Science and Technology, 08.11.2006.

Research output: Contribution to journalArticle

S.Kimura, SK, K.Iwamoto, KI, M.Kadoshima, MK, Y.Nunoshige, YN, A.Ogawa, AO, T.Nabatame, TN, H.Ohta, HO, A.Toriumi, AT, T.Ohishi, TO & Oishi, T 2006, 'Effect of residual OH impurities in ALD high-k films on interfacial SiO2 growth', 2006 International Workshop on Dielectric Thin Films for Future ULSI Devices-Science and Technology.
S.Kimura, S.Kimura ; K.Iwamoto, K.Iwamoto ; M.Kadoshima, M.Kadoshima ; Y.Nunoshige, Y.Nunoshige ; A.Ogawa, A.Ogawa ; T.Nabatame, T.Nabatame ; H.Ohta, H.Ohta ; A.Toriumi, A.Toriumi ; T.Ohishi, T.Ohishi ; Oishi, Tomoji. / Effect of residual OH impurities in ALD high-k films on interfacial SiO2 growth. In: 2006 International Workshop on Dielectric Thin Films for Future ULSI Devices-Science and Technology. 2006.
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author = "S.Kimura S.Kimura and K.Iwamoto K.Iwamoto and M.Kadoshima M.Kadoshima and Y.Nunoshige Y.Nunoshige and A.Ogawa A.Ogawa and T.Nabatame T.Nabatame and H.Ohta H.Ohta and A.Toriumi A.Toriumi and T.Ohishi T.Ohishi and Tomoji Oishi",
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AU - S.Kimura, S.Kimura

AU - K.Iwamoto, K.Iwamoto

AU - M.Kadoshima, M.Kadoshima

AU - Y.Nunoshige, Y.Nunoshige

AU - A.Ogawa, A.Ogawa

AU - T.Nabatame, T.Nabatame

AU - H.Ohta, H.Ohta

AU - A.Toriumi, A.Toriumi

AU - T.Ohishi, T.Ohishi

AU - Oishi, Tomoji

PY - 2006/11/8

Y1 - 2006/11/8

M3 - Article

JO - 2006 International Workshop on Dielectric Thin Films for Future ULSI Devices-Science and Technology

JF - 2006 International Workshop on Dielectric Thin Films for Future ULSI Devices-Science and Technology

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