Effect of Temperature for Photoresist Critical Dimension during Puddle Development

Research output: Contribution to journalArticle

1 Citation (Scopus)
Original languageEnglish
Pages (from-to)3354-3358
JournalJapanese Journal of Applied Physics
Volume46
Publication statusPublished - 2007 Jun 1

Cite this

Effect of Temperature for Photoresist Critical Dimension during Puddle Development. / Eto, H.; Homma, H. Eto;Y.Ito;T.

In: Japanese Journal of Applied Physics, Vol. 46, 01.06.2007, p. 3354-3358.

Research output: Contribution to journalArticle

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title = "Effect of Temperature for Photoresist Critical Dimension during Puddle Development",
author = "H. Eto and Homma, {H. Eto;Y.Ito;T.}",
year = "2007",
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language = "English",
volume = "46",
pages = "3354--3358",
journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",
issn = "0021-4922",
publisher = "Japan Society of Applied Physics",

}

TY - JOUR

T1 - Effect of Temperature for Photoresist Critical Dimension during Puddle Development

AU - Eto, H.

AU - Homma, H. Eto;Y.Ito;T.

PY - 2007/6/1

Y1 - 2007/6/1

M3 - Article

VL - 46

SP - 3354

EP - 3358

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

ER -