Effects of Argon Gas Flow Rate and Furnace Pressure on Oxygen Concentration in Czochralski-Grown Silicon Crystals

Masahiro Shoji, Naoki Ono, Keisei Abe, Michio Kida, Yasuo Shimizu

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)362-368
JournalJournal of Crystal Growth
Volume186
Publication statusPublished - 1997 Aug 28

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