Effects of humidity and solution age on growth of organosilane self-assembled monolayers

Sunhyung Lee, Takahiro Ishizaki, Nagahiro Saito, Osamu Takai

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

The effect of humidity on the self-organization and growth mechanism of octadecyltrichlorosilane (OTS) monolayers was investigated using an atomic force microscope (AFM), grazing incidence X-ray diffraction (GIXD), and Fourier transform IR spectroscopy (FT-IR). OTS self-assembled monolayers (SAMs) were prepared under humidity ranging from 5 to 80%. Under humidity ranging from 15 to 80%, OTS molecules produced domain structures early in the growth process that grew twodimensionally on SiO2 substrates. Also, the crystalline peaks of the obtained from the GIXD measurement indicated that OTSSAMs prepared under high humidity (15-80%) had grown in a crystalline state. Thus, "self-organization" occurred under these conditions. However, OTS-SAMs prepared under 5% humidity were in an amorphous structure. OTS-SAMs prepared at high humidity were denser than those prepared at low humidity. The domain size early in the growth process increased in proportion to the solution age. This shows that the reaction rate is governed by the hydrolysis of organosilane. On the other hand, solution age has no great influence on the density of the OTS-SAMs under conditions of more than 50% humidity.

Original languageEnglish
Pages (from-to)6416-6421
Number of pages6
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume47
Issue number8 PART 1
DOIs
Publication statusPublished - 2008 Aug 8
Externally publishedYes

Fingerprint

Self assembled monolayers
humidity
Atmospheric humidity
grazing incidence
Crystalline materials
X ray diffraction
diffraction
Reaction rates
hydrolysis
Infrared spectroscopy
Hydrolysis
Monolayers
proportion
Fourier transforms
reaction kinetics
Microscopes
x rays
microscopes
Molecules
Substrates

Keywords

  • Atomic force microscope
  • Grazing incidence X-ray diffraction
  • Humidity and solution age
  • Self-assembled monolayer
  • Self-organization

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Effects of humidity and solution age on growth of organosilane self-assembled monolayers. / Lee, Sunhyung; Ishizaki, Takahiro; Saito, Nagahiro; Takai, Osamu.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 47, No. 8 PART 1, 08.08.2008, p. 6416-6421.

Research output: Contribution to journalArticle

@article{d9e0a597b51d49f48089ff456ab08006,
title = "Effects of humidity and solution age on growth of organosilane self-assembled monolayers",
abstract = "The effect of humidity on the self-organization and growth mechanism of octadecyltrichlorosilane (OTS) monolayers was investigated using an atomic force microscope (AFM), grazing incidence X-ray diffraction (GIXD), and Fourier transform IR spectroscopy (FT-IR). OTS self-assembled monolayers (SAMs) were prepared under humidity ranging from 5 to 80{\%}. Under humidity ranging from 15 to 80{\%}, OTS molecules produced domain structures early in the growth process that grew twodimensionally on SiO2 substrates. Also, the crystalline peaks of the obtained from the GIXD measurement indicated that OTSSAMs prepared under high humidity (15-80{\%}) had grown in a crystalline state. Thus, {"}self-organization{"} occurred under these conditions. However, OTS-SAMs prepared under 5{\%} humidity were in an amorphous structure. OTS-SAMs prepared at high humidity were denser than those prepared at low humidity. The domain size early in the growth process increased in proportion to the solution age. This shows that the reaction rate is governed by the hydrolysis of organosilane. On the other hand, solution age has no great influence on the density of the OTS-SAMs under conditions of more than 50{\%} humidity.",
keywords = "Atomic force microscope, Grazing incidence X-ray diffraction, Humidity and solution age, Self-assembled monolayer, Self-organization",
author = "Sunhyung Lee and Takahiro Ishizaki and Nagahiro Saito and Osamu Takai",
year = "2008",
month = "8",
day = "8",
doi = "10.1143/JJAP.47.6416",
language = "English",
volume = "47",
pages = "6416--6421",
journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",
issn = "0021-4922",
publisher = "Japan Society of Applied Physics",
number = "8 PART 1",

}

TY - JOUR

T1 - Effects of humidity and solution age on growth of organosilane self-assembled monolayers

AU - Lee, Sunhyung

AU - Ishizaki, Takahiro

AU - Saito, Nagahiro

AU - Takai, Osamu

PY - 2008/8/8

Y1 - 2008/8/8

N2 - The effect of humidity on the self-organization and growth mechanism of octadecyltrichlorosilane (OTS) monolayers was investigated using an atomic force microscope (AFM), grazing incidence X-ray diffraction (GIXD), and Fourier transform IR spectroscopy (FT-IR). OTS self-assembled monolayers (SAMs) were prepared under humidity ranging from 5 to 80%. Under humidity ranging from 15 to 80%, OTS molecules produced domain structures early in the growth process that grew twodimensionally on SiO2 substrates. Also, the crystalline peaks of the obtained from the GIXD measurement indicated that OTSSAMs prepared under high humidity (15-80%) had grown in a crystalline state. Thus, "self-organization" occurred under these conditions. However, OTS-SAMs prepared under 5% humidity were in an amorphous structure. OTS-SAMs prepared at high humidity were denser than those prepared at low humidity. The domain size early in the growth process increased in proportion to the solution age. This shows that the reaction rate is governed by the hydrolysis of organosilane. On the other hand, solution age has no great influence on the density of the OTS-SAMs under conditions of more than 50% humidity.

AB - The effect of humidity on the self-organization and growth mechanism of octadecyltrichlorosilane (OTS) monolayers was investigated using an atomic force microscope (AFM), grazing incidence X-ray diffraction (GIXD), and Fourier transform IR spectroscopy (FT-IR). OTS self-assembled monolayers (SAMs) were prepared under humidity ranging from 5 to 80%. Under humidity ranging from 15 to 80%, OTS molecules produced domain structures early in the growth process that grew twodimensionally on SiO2 substrates. Also, the crystalline peaks of the obtained from the GIXD measurement indicated that OTSSAMs prepared under high humidity (15-80%) had grown in a crystalline state. Thus, "self-organization" occurred under these conditions. However, OTS-SAMs prepared under 5% humidity were in an amorphous structure. OTS-SAMs prepared at high humidity were denser than those prepared at low humidity. The domain size early in the growth process increased in proportion to the solution age. This shows that the reaction rate is governed by the hydrolysis of organosilane. On the other hand, solution age has no great influence on the density of the OTS-SAMs under conditions of more than 50% humidity.

KW - Atomic force microscope

KW - Grazing incidence X-ray diffraction

KW - Humidity and solution age

KW - Self-assembled monolayer

KW - Self-organization

UR - http://www.scopus.com/inward/record.url?scp=55149103334&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=55149103334&partnerID=8YFLogxK

U2 - 10.1143/JJAP.47.6416

DO - 10.1143/JJAP.47.6416

M3 - Article

AN - SCOPUS:55149103334

VL - 47

SP - 6416

EP - 6421

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

IS - 8 PART 1

ER -