Effects of thermal anneal on the UV photosensitivity for writing of Bragg gratings on Ge-doped silica thin films by a plasma CVD method

P2-27,pp.636-639 , June 5-9, 2005, Kitakyushu, Japan

Tomomi Hattori; Emi Irisawa; Hiroyuki Nishikawa

Effects of thermal anneal on the UV photosensitivity for writing of Bragg gratings on Ge-doped silica thin films by a plasma CVD method P2-27,pp.636-639 , June 5-9, 2005, Kitakyushu, Japan

Tomomi Hattori, Emi Irisawa, Hiroyuki Nishikawa

Regional Environment Systems

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	636-639
Journal	Proceedings of 2005 International Symposium on Electrical Insulating Materials,
Publication status	Published - 2005 Jun 8

Cite this

Effects of thermal anneal on the UV photosensitivity for writing of Bragg gratings on Ge-doped silica thin films by a plasma CVD method P2-27,pp.636-639 , June 5-9, 2005, Kitakyushu, Japan. / Hattori, Tomomi; Irisawa, Emi; Nishikawa, Hiroyuki.

In: Proceedings of 2005 International Symposium on Electrical Insulating Materials, 08.06.2005, p. 636-639.

Research output: Contribution to journal › Article › peer-review

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