Effects of thermal anneal on the UV photosensitivity for writing of Bragg gratings on Ge-doped silica thin films by a plasma CVD method P2-27,pp.636-639 , June 5-9, 2005, Kitakyushu, Japan

Tomomi Hattori, Emi Irisawa, Hiroyuki Nishikawa

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)636-639
JournalProceedings of 2005 International Symposium on Electrical Insulating Materials,
Publication statusPublished - 2005 Jun 8

Cite this

@article{ceb951d8426146db89d088cd4a613b1a,
title = "Effects of thermal anneal on the UV photosensitivity for writing of Bragg gratings on Ge-doped silica thin films by a plasma CVD method P2-27,pp.636-639 , June 5-9, 2005, Kitakyushu, Japan",
author = "Tomomi Hattori and Emi Irisawa and Hiroyuki Nishikawa",
year = "2005",
month = "6",
day = "8",
language = "English",
pages = "636--639",
journal = "Proceedings of 2005 International Symposium on Electrical Insulating Materials,",

}

TY - JOUR

T1 - Effects of thermal anneal on the UV photosensitivity for writing of Bragg gratings on Ge-doped silica thin films by a plasma CVD method P2-27,pp.636-639 , June 5-9, 2005, Kitakyushu, Japan

AU - Hattori, Tomomi

AU - Irisawa, Emi

AU - Nishikawa, Hiroyuki

PY - 2005/6/8

Y1 - 2005/6/8

M3 - Article

SP - 636

EP - 639

JO - Proceedings of 2005 International Symposium on Electrical Insulating Materials,

JF - Proceedings of 2005 International Symposium on Electrical Insulating Materials,

ER -