Electroforming of Ni mold for imprint lithography using high-aspect-ratio PMMA microstructures fabricated by proton beam writing

Yusuke Tanabe, Hiroyuki Nishikawa, Yoshihiro Seki, Takahiro Satoh, Yasuyuki Ishii, Tomihiro Kamiya, Tohru Watanabe, Atsushi Sekiguchi

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

Proton beam writing (PBW) was applied for micromachining of a PMMA mother for Ni electroforming. Proton beam focused down to about 1 μm at beam energy of 1.0-3.0 MeV was used for PBW on a PMMA layer on Si or Cu substrate. Using modified techniques for developing of 15-30-μm thick resists exposed to PB and electroforming steps, fabrication of the Ni structures with aspect ratio up to 30 by electroforming with a 30-μm thick PMMA mother micromachined by PBW was successful. We also tried thermal imprint using a 15-μm thick Ni microstructure on Cu substrate with an aspect ratio of more than 4 on a PMMA film.

Original languageEnglish
Pages (from-to)2145-2148
Number of pages4
JournalMicroelectronic Engineering
Volume88
Issue number8
DOIs
Publication statusPublished - 2011 Aug

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Keywords

  • Electroforming
  • Imprint lithography
  • Mold
  • Proton beam writing

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics

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