Electroless NiB Liner on Organosilane Layers

H. Aramaki, M. Yoshino, I. Matsuda, K. Ueno, Y. Shacham-Diam, T. Osaka

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)108-109
JournalAdvanced Metallization Conference 2008, Asian Session Abstracts
Publication statusPublished - 2008 Oct 8

Cite this

Aramaki, H., Yoshino, M., Matsuda, I., Ueno, K., Shacham-Diam, Y., & Osaka, T. (2008). Electroless NiB Liner on Organosilane Layers. Advanced Metallization Conference 2008, Asian Session Abstracts, 108-109.

Electroless NiB Liner on Organosilane Layers. / Aramaki, H.; Yoshino, M.; Matsuda, I.; Ueno, K.; Shacham-Diam, Y.; Osaka, T.

In: Advanced Metallization Conference 2008, Asian Session Abstracts, 08.10.2008, p. 108-109.

Research output: Contribution to journalArticle

Aramaki, H, Yoshino, M, Matsuda, I, Ueno, K, Shacham-Diam, Y & Osaka, T 2008, 'Electroless NiB Liner on Organosilane Layers', Advanced Metallization Conference 2008, Asian Session Abstracts, pp. 108-109.
Aramaki H, Yoshino M, Matsuda I, Ueno K, Shacham-Diam Y, Osaka T. Electroless NiB Liner on Organosilane Layers. Advanced Metallization Conference 2008, Asian Session Abstracts. 2008 Oct 8;108-109.
Aramaki, H. ; Yoshino, M. ; Matsuda, I. ; Ueno, K. ; Shacham-Diam, Y. ; Osaka, T. / Electroless NiB Liner on Organosilane Layers. In: Advanced Metallization Conference 2008, Asian Session Abstracts. 2008 ; pp. 108-109.
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AU - Shacham-Diam, Y.

AU - Osaka, T.

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JO - Advanced Metallization Conference 2008, Asian Session Abstracts

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