Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons

K. Mitsuishi, Masayuki Shimojo, M. Han, K. Furuya

Research output: Contribution to journal › Article

116 Citations (Scopus)

Abstract

The electron-beam-induced deposition of high-energy electrons by using a subnanometer-sized probe was discussed. The nanometer-sized dots with a diameter of less than 5 nm were also fabricated. It was observed that the deposition period strongly affected the size of the deposits in the transmission electron microscopy (TEM).

Original languageEnglish
Pages (from-to)2064-2066
Number of pages3
JournalApplied Physics Letters
Volume83
Issue number10
DOIs
Publication statusPublished - 2003 Sep 8
Externally publishedYes

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high energy electrons
electron beams
probes
deposits
transmission electron microscopy

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons. / Mitsuishi, K.; Shimojo, Masayuki; Han, M.; Furuya, K.

In: Applied Physics Letters, Vol. 83, No. 10, 08.09.2003, p. 2064-2066.

Research output: Contribution to journal › Article

Mitsuishi, K, Shimojo, M, Han, M & Furuya, K 2003, 'Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons', Applied Physics Letters, vol. 83, no. 10, pp. 2064-2066. https://doi.org/10.1063/1.1611274
Mitsuishi K, Shimojo M, Han M, Furuya K. Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons. Applied Physics Letters. 2003 Sep 8;83(10):2064-2066. https://doi.org/10.1063/1.1611274
Mitsuishi, K. ; Shimojo, Masayuki ; Han, M. ; Furuya, K. / Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons. In: Applied Physics Letters. 2003 ; Vol. 83, No. 10. pp. 2064-2066.
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