Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons

K. Mitsuishi; M. Shimojo; M. Han; K. Furuya

doi:10.1063/1.1611274

Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons

K. Mitsuishi, M. Shimojo, M. Han, K. Furuya

Research output: Contribution to journal › Article › peer-review

119 Citations (Scopus)

Abstract

The electron-beam-induced deposition of high-energy electrons by using a subnanometer-sized probe was discussed. The nanometer-sized dots with a diameter of less than 5 nm were also fabricated. It was observed that the deposition period strongly affected the size of the deposits in the transmission electron microscopy (TEM).

Original language	English
Pages (from-to)	2064-2066
Number of pages	3
Journal	Applied Physics Letters
Volume	83
Issue number	10
DOIs	https://doi.org/10.1063/1.1611274
Publication status	Published - 2003 Sep 8
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

Access to Document

10.1063/1.1611274

Cite this

@article{316a997964d442d9a663f81381644f49,

title = "Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons",

abstract = "The electron-beam-induced deposition of high-energy electrons by using a subnanometer-sized probe was discussed. The nanometer-sized dots with a diameter of less than 5 nm were also fabricated. It was observed that the deposition period strongly affected the size of the deposits in the transmission electron microscopy (TEM).",

author = "K. Mitsuishi and M. Shimojo and M. Han and K. Furuya",

year = "2003",

month = sep,

day = "8",

doi = "10.1063/1.1611274",

language = "English",

volume = "83",

pages = "2064--2066",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

number = "10",

}

TY - JOUR

T1 - Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons

AU - Mitsuishi, K.

AU - Shimojo, M.

AU - Han, M.

AU - Furuya, K.

PY - 2003/9/8

Y1 - 2003/9/8

N2 - The electron-beam-induced deposition of high-energy electrons by using a subnanometer-sized probe was discussed. The nanometer-sized dots with a diameter of less than 5 nm were also fabricated. It was observed that the deposition period strongly affected the size of the deposits in the transmission electron microscopy (TEM).

AB - The electron-beam-induced deposition of high-energy electrons by using a subnanometer-sized probe was discussed. The nanometer-sized dots with a diameter of less than 5 nm were also fabricated. It was observed that the deposition period strongly affected the size of the deposits in the transmission electron microscopy (TEM).

UR - http://www.scopus.com/inward/record.url?scp=0141920551&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0141920551&partnerID=8YFLogxK

U2 - 10.1063/1.1611274

DO - 10.1063/1.1611274

M3 - Article

AN - SCOPUS:0141920551

VL - 83

SP - 2064

EP - 2066

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 10

ER -

Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this