Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons

K. Mitsuishi; Masayuki Shimojo; M. Han; K. Furuya

doi:10.1063/1.1611274

Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons

K. Mitsuishi, Masayuki Shimojo, M. Han, K. Furuya

Research output: Contribution to journal › Article

118 Citations (Scopus)

Abstract

The electron-beam-induced deposition of high-energy electrons by using a subnanometer-sized probe was discussed. The nanometer-sized dots with a diameter of less than 5 nm were also fabricated. It was observed that the deposition period strongly affected the size of the deposits in the transmission electron microscopy (TEM).

Original language	English
Pages (from-to)	2064-2066
Number of pages	3
Journal	Applied Physics Letters
Volume	83
Issue number	10
DOIs	https://doi.org/10.1063/1.1611274
Publication status	Published - 2003 Sep 8
Externally published	Yes

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ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

Cite this

Mitsuishi, K., Shimojo, M., Han, M., & Furuya, K. (2003). Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons. Applied Physics Letters, 83(10), 2064-2066. https://doi.org/10.1063/1.1611274

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Access to Document

10.1063/1.1611274