Abstract
The electron-beam-induced deposition of high-energy electrons by using a subnanometer-sized probe was discussed. The nanometer-sized dots with a diameter of less than 5 nm were also fabricated. It was observed that the deposition period strongly affected the size of the deposits in the transmission electron microscopy (TEM).
| Original language | English |
|---|---|
| Pages (from-to) | 2064-2066 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 83 |
| Issue number | 10 |
| DOIs | |
| Publication status | Published - 2003 Sep 8 |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)
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Cite this
Mitsuishi, K., Shimojo, M., Han, M., & Furuya, K. (2003). Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons. Applied Physics Letters, 83(10), 2064-2066. https://doi.org/10.1063/1.1611274