Abstract
The electron-beam-induced deposition of high-energy electrons by using a subnanometer-sized probe was discussed. The nanometer-sized dots with a diameter of less than 5 nm were also fabricated. It was observed that the deposition period strongly affected the size of the deposits in the transmission electron microscopy (TEM).
Original language | English |
---|---|
Pages (from-to) | 2064-2066 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 83 |
Issue number | 10 |
DOIs | |
Publication status | Published - 2003 Sep 8 |
Externally published | Yes |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)