Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons

K. Mitsuishi, Masayuki Shimojo, M. Han, K. Furuya

Research output: Contribution to journalArticle

117 Citations (Scopus)

Abstract

The electron-beam-induced deposition of high-energy electrons by using a subnanometer-sized probe was discussed. The nanometer-sized dots with a diameter of less than 5 nm were also fabricated. It was observed that the deposition period strongly affected the size of the deposits in the transmission electron microscopy (TEM).

Original languageEnglish
Pages (from-to)2064-2066
Number of pages3
JournalApplied Physics Letters
Volume83
Issue number10
DOIs
Publication statusPublished - 2003 Sep 8
Externally publishedYes

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high energy electrons
electron beams
probes
deposits
transmission electron microscopy

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons. / Mitsuishi, K.; Shimojo, Masayuki; Han, M.; Furuya, K.

In: Applied Physics Letters, Vol. 83, No. 10, 08.09.2003, p. 2064-2066.

Research output: Contribution to journalArticle

@article{316a997964d442d9a663f81381644f49,
title = "Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons",
abstract = "The electron-beam-induced deposition of high-energy electrons by using a subnanometer-sized probe was discussed. The nanometer-sized dots with a diameter of less than 5 nm were also fabricated. It was observed that the deposition period strongly affected the size of the deposits in the transmission electron microscopy (TEM).",
author = "K. Mitsuishi and Masayuki Shimojo and M. Han and K. Furuya",
year = "2003",
month = "9",
day = "8",
doi = "10.1063/1.1611274",
language = "English",
volume = "83",
pages = "2064--2066",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics Publising LLC",
number = "10",

}

TY - JOUR

T1 - Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons

AU - Mitsuishi, K.

AU - Shimojo, Masayuki

AU - Han, M.

AU - Furuya, K.

PY - 2003/9/8

Y1 - 2003/9/8

N2 - The electron-beam-induced deposition of high-energy electrons by using a subnanometer-sized probe was discussed. The nanometer-sized dots with a diameter of less than 5 nm were also fabricated. It was observed that the deposition period strongly affected the size of the deposits in the transmission electron microscopy (TEM).

AB - The electron-beam-induced deposition of high-energy electrons by using a subnanometer-sized probe was discussed. The nanometer-sized dots with a diameter of less than 5 nm were also fabricated. It was observed that the deposition period strongly affected the size of the deposits in the transmission electron microscopy (TEM).

UR - http://www.scopus.com/inward/record.url?scp=0141920551&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0141920551&partnerID=8YFLogxK

U2 - 10.1063/1.1611274

DO - 10.1063/1.1611274

M3 - Article

AN - SCOPUS:0141920551

VL - 83

SP - 2064

EP - 2066

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 10

ER -