Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons

K. Mitsuishi, Masayuki Shimojo, M. Han, K. Furuya

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118 Citations (Scopus)

Abstract

The electron-beam-induced deposition of high-energy electrons by using a subnanometer-sized probe was discussed. The nanometer-sized dots with a diameter of less than 5 nm were also fabricated. It was observed that the deposition period strongly affected the size of the deposits in the transmission electron microscopy (TEM).

Original languageEnglish
Pages (from-to)2064-2066
Number of pages3
JournalApplied Physics Letters
Volume83
Issue number10
DOIs
Publication statusPublished - 2003 Sep 8
Externally publishedYes

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ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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