Electron holographic study of the contact resistance of connected nanowires on resistivity measurement.

M. Takeguchi, M. Shimojo, M. Tanaka, R. Che, W.Zhang W.Zhang, K. Furuya

Research output: Contribution to journalArticle

6 Citations (Scopus)
Original languageEnglish
Pages (from-to)1628-1631
JournalSurf.Interface Anal.
Volume38
Publication statusPublished - 2006 Jan 1

Cite this

Takeguchi, M., Shimojo, M., Tanaka, M., Che, R., W.Zhang, W. Z., & Furuya, K. (2006). Electron holographic study of the contact resistance of connected nanowires on resistivity measurement. Surf.Interface Anal., 38, 1628-1631.

Electron holographic study of the contact resistance of connected nanowires on resistivity measurement. / Takeguchi, M.; Shimojo, M.; Tanaka, M.; Che, R.; W.Zhang, W.Zhang; Furuya, K.

In: Surf.Interface Anal., Vol. 38, 01.01.2006, p. 1628-1631.

Research output: Contribution to journalArticle

Takeguchi, M, Shimojo, M, Tanaka, M, Che, R, W.Zhang, WZ & Furuya, K 2006, 'Electron holographic study of the contact resistance of connected nanowires on resistivity measurement.', Surf.Interface Anal., vol. 38, pp. 1628-1631.
Takeguchi, M. ; Shimojo, M. ; Tanaka, M. ; Che, R. ; W.Zhang, W.Zhang ; Furuya, K. / Electron holographic study of the contact resistance of connected nanowires on resistivity measurement. In: Surf.Interface Anal. 2006 ; Vol. 38. pp. 1628-1631.
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