Electron holographic study of the effect of contact resistance of connected nanowires on resistivity measurement

M. Takeguchi, M. Shimojo, M. Tanaka, R. Che, W. Zhang, K. Furuya

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Nanowires were formed on a tungsten tip and on an edge of a metal substrate by electron beam induced deposition (EBID), and were made to come in contact with each other in a specially designed transmission electron microscope (TEM) sample holder to perform the measurement of the resistivity of the nanowires. The resistivity of the contacted nanowires was very high (>0.01 Ωm) immediately after making contact. During the resistivity measurement, potential distribution around the contacted nanowires was observed by electron holography, and it was revealed that electric field concentrated on the contact point. It was due to the insulative character of the contact. The irradiation of an intense electron beam decreased such high contact resistance, and electron holographic observation showed that the electric field distribution became uniform.

Original languageEnglish
Pages (from-to)1628-1631
Number of pages4
JournalSurface and Interface Analysis
Volume38
Issue number12-13
DOIs
Publication statusPublished - 2006 Dec 1

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Keywords

  • Electron beam induced deposition
  • Electron holography
  • Nanowire
  • Resistivity
  • Transmission electron microscopy

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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