Electron holographic study of the effect of contact resistance of connected nanowires on resistivity measurement

M. Takeguchi; M. Shimojo; M. Tanaka; R. Che; W. Zhang; K. Furuya

doi:10.1002/sia.2403

Electron holographic study of the effect of contact resistance of connected nanowires on resistivity measurement

M. Takeguchi, M. Shimojo, M. Tanaka, R. Che, W. Zhang, K. Furuya

Research output: Contribution to journal › Article

6 Citations (Scopus)

Abstract

Nanowires were formed on a tungsten tip and on an edge of a metal substrate by electron beam induced deposition (EBID), and were made to come in contact with each other in a specially designed transmission electron microscope (TEM) sample holder to perform the measurement of the resistivity of the nanowires. The resistivity of the contacted nanowires was very high (>0.01 Ωm) immediately after making contact. During the resistivity measurement, potential distribution around the contacted nanowires was observed by electron holography, and it was revealed that electric field concentrated on the contact point. It was due to the insulative character of the contact. The irradiation of an intense electron beam decreased such high contact resistance, and electron holographic observation showed that the electric field distribution became uniform.

Original language	English
Pages (from-to)	1628-1631
Number of pages	4
Journal	Surface and Interface Analysis
Volume	38
Issue number	12-13
DOIs	https://doi.org/10.1002/sia.2403
Publication status	Published - 2006 Dec 1

Fingerprint

Keywords

Electron beam induced deposition
Electron holography
Nanowire
Resistivity
Transmission electron microscopy

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

Cite this

Takeguchi, M., Shimojo, M., Tanaka, M., Che, R., Zhang, W., & Furuya, K. (2006). Electron holographic study of the effect of contact resistance of connected nanowires on resistivity measurement. Surface and Interface Analysis, 38(12-13), 1628-1631. https://doi.org/10.1002/sia.2403

@article{a8fce588e5154200a089af4b2ba802ef,

title = "Electron holographic study of the effect of contact resistance of connected nanowires on resistivity measurement",

abstract = "Nanowires were formed on a tungsten tip and on an edge of a metal substrate by electron beam induced deposition (EBID), and were made to come in contact with each other in a specially designed transmission electron microscope (TEM) sample holder to perform the measurement of the resistivity of the nanowires. The resistivity of the contacted nanowires was very high (>0.01 Ωm) immediately after making contact. During the resistivity measurement, potential distribution around the contacted nanowires was observed by electron holography, and it was revealed that electric field concentrated on the contact point. It was due to the insulative character of the contact. The irradiation of an intense electron beam decreased such high contact resistance, and electron holographic observation showed that the electric field distribution became uniform.",

keywords = "Electron beam induced deposition, Electron holography, Nanowire, Resistivity, Transmission electron microscopy",

author = "M. Takeguchi and M. Shimojo and M. Tanaka and R. Che and W. Zhang and K. Furuya",

year = "2006",

month = dec

day = "1",

doi = "10.1002/sia.2403",

language = "English",

volume = "38",

pages = "1628--1631",

journal = "Surface and Interface Analysis",

issn = "0142-2421",

publisher = "John Wiley and Sons Ltd",

number = "12-13",

}

TY - JOUR

T1 - Electron holographic study of the effect of contact resistance of connected nanowires on resistivity measurement

AU - Takeguchi, M.

AU - Shimojo, M.

AU - Tanaka, M.

AU - Che, R.

AU - Zhang, W.

AU - Furuya, K.

PY - 2006/12/1

Y1 - 2006/12/1

N2 - Nanowires were formed on a tungsten tip and on an edge of a metal substrate by electron beam induced deposition (EBID), and were made to come in contact with each other in a specially designed transmission electron microscope (TEM) sample holder to perform the measurement of the resistivity of the nanowires. The resistivity of the contacted nanowires was very high (>0.01 Ωm) immediately after making contact. During the resistivity measurement, potential distribution around the contacted nanowires was observed by electron holography, and it was revealed that electric field concentrated on the contact point. It was due to the insulative character of the contact. The irradiation of an intense electron beam decreased such high contact resistance, and electron holographic observation showed that the electric field distribution became uniform.

AB - Nanowires were formed on a tungsten tip and on an edge of a metal substrate by electron beam induced deposition (EBID), and were made to come in contact with each other in a specially designed transmission electron microscope (TEM) sample holder to perform the measurement of the resistivity of the nanowires. The resistivity of the contacted nanowires was very high (>0.01 Ωm) immediately after making contact. During the resistivity measurement, potential distribution around the contacted nanowires was observed by electron holography, and it was revealed that electric field concentrated on the contact point. It was due to the insulative character of the contact. The irradiation of an intense electron beam decreased such high contact resistance, and electron holographic observation showed that the electric field distribution became uniform.

KW - Electron beam induced deposition

KW - Electron holography

KW - Nanowire

KW - Resistivity

KW - Transmission electron microscopy

UR - http://www.scopus.com/inward/record.url?scp=33845947352&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33845947352&partnerID=8YFLogxK

U2 - 10.1002/sia.2403

DO - 10.1002/sia.2403

M3 - Article

AN - SCOPUS:33845947352

VL - 38

SP - 1628

EP - 1631

JO - Surface and Interface Analysis

JF - Surface and Interface Analysis

SN - 0142-2421

IS - 12-13

ER -

Access to Document

10.1002/sia.2403