| Original language | English |
|---|---|
| Journal | Default journal |
| Publication status | Published - 2005 Dec 1 |
Cite this
Takeguchi, M., Shimojo, M., Tanaka, M., Che, R., Zhang, W., & Furuya, K. (2005). Electron holography studies of the effect of resistance at the wire-wire contact in resistivity measurement of nanowires formed by electron beam induced deposition. Default journal.
Electron holography studies of the effect of resistance at the wire-wire contact in resistivity measurement of nanowires formed by electron beam induced deposition. / Takeguchi, M.; Shimojo, M.; Tanaka, M.; Che, R.; Zhang, W.; Furuya, K.
In: Default journal, 01.12.2005.Research output: Contribution to journal › Article
Takeguchi, M, Shimojo, M, Tanaka, M, Che, R, Zhang, W & Furuya, K 2005, 'Electron holography studies of the effect of resistance at the wire-wire contact in resistivity measurement of nanowires formed by electron beam induced deposition', Default journal.
Takeguchi M, Shimojo M, Tanaka M, Che R, Zhang W, Furuya K. Electron holography studies of the effect of resistance at the wire-wire contact in resistivity measurement of nanowires formed by electron beam induced deposition. Default journal. 2005 Dec 1.
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title = "Electron holography studies of the effect of resistance at the wire-wire contact in resistivity measurement of nanowires formed by electron beam induced deposition",
author = "M. Takeguchi and M. Shimojo and M. Tanaka and R. Che and W. Zhang and K. Furuya",
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TY - JOUR
T1 - Electron holography studies of the effect of resistance at the wire-wire contact in resistivity measurement of nanowires formed by electron beam induced deposition
AU - Takeguchi, M.
AU - Shimojo, M.
AU - Tanaka, M.
AU - Che, R.
AU - Zhang, W.
AU - Furuya, K.
PY - 2005/12/1
Y1 - 2005/12/1
M3 - Article
JO - Default journal
JF - Default journal
ER -