Electron holography studies of the effect of resistance at the wire-wire contact in resistivity measurement of nanowires formed by electron beam induced deposition

M. Takeguchi; M. Shimojo; M. Tanaka; R. Che; W. Zhang; K. Furuya

Electron holography studies of the effect of resistance at the wire-wire contact in resistivity measurement of nanowires formed by electron beam induced deposition

M. Takeguchi, M. Shimojo, M. Tanaka, R. Che, W. Zhang, K. Furuya

Functional Control Systems

Research output: Contribution to journal › Article

Original language	English
Journal	Default journal
Publication status	Published - 2005 Dec 1

Cite this

Takeguchi, M., Shimojo, M., Tanaka, M., Che, R., Zhang, W., & Furuya, K. (2005). Electron holography studies of the effect of resistance at the wire-wire contact in resistivity measurement of nanowires formed by electron beam induced deposition. Default journal.

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title = "Electron holography studies of the effect of resistance at the wire-wire contact in resistivity measurement of nanowires formed by electron beam induced deposition",

author = "M. Takeguchi and M. Shimojo and M. Tanaka and R. Che and W. Zhang and K. Furuya",

year = "2005",

month = dec,

day = "1",

language = "English",

journal = "Default journal",

}