Electron holography studies of the effect of resistance at the wire-wire contact in resistivity measurement of nanowires formed by electron beam induced deposition

M. Takeguchi, M. Shimojo, M. Tanaka, R. Che, W. Zhang, K. Furuya

Research output: Contribution to journalArticle

Original languageEnglish
JournalDefault journal
Publication statusPublished - 2005 Dec 1

Cite this

Electron holography studies of the effect of resistance at the wire-wire contact in resistivity measurement of nanowires formed by electron beam induced deposition. / Takeguchi, M.; Shimojo, M.; Tanaka, M.; Che, R.; Zhang, W.; Furuya, K.

In: Default journal, 01.12.2005.

Research output: Contribution to journalArticle

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AU - Che, R.

AU - Zhang, W.

AU - Furuya, K.

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