Electron induced nanodeposition of tungsten using field emission scanning and transmission electron microscopes

M. Shimojo, K. Mitsuishi, A. Tameike, K. Furuya

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33 Citations (Scopus)

Abstract

Electron beam induced chemical vapor deposition (EBI-CVD) was carried out using field-emission gun scanning electron microscope (FE-SEM) and a field emission gun transmission electron microscope (FE-TEM) for nanodeposition of tungsten. A comparision was made between deposition size and probe size. It was observed that a nanometer sized dot was produced in less than 1 s. It was suggested that the size of the dots depended on probe size including the broadening in the substrate at a constant gas flux. It was found that by scanning the beam position rods, 8 nm diameter deposits could be produced at desired positions.

Original languageEnglish
Pages (from-to)742-746
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume22
Issue number2
Publication statusPublished - 2004 Mar 1

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ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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