Electron beam induced chemical vapor deposition (EBI-CVD) was carried out using field-emission gun scanning electron microscope (FE-SEM) and a field emission gun transmission electron microscope (FE-TEM) for nanodeposition of tungsten. A comparision was made between deposition size and probe size. It was observed that a nanometer sized dot was produced in less than 1 s. It was suggested that the size of the dots depended on probe size including the broadening in the substrate at a constant gas flux. It was found that by scanning the beam position rods, 8 nm diameter deposits could be produced at desired positions.
|Number of pages||5|
|Journal||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures|
|Publication status||Published - 2004 Mar 1|
ASJC Scopus subject areas
- Condensed Matter Physics
- Electrical and Electronic Engineering