Electron induced nanodeposition of tungsten using field emission scanning and transmission electron microscopes

Masayuki Shimojo, K. Mitsuishi, A. Tameike, K. Furuya

Research output: Contribution to journalArticle

33 Citations (Scopus)

Abstract

Electron beam induced chemical vapor deposition (EBI-CVD) was carried out using field-emission gun scanning electron microscope (FE-SEM) and a field emission gun transmission electron microscope (FE-TEM) for nanodeposition of tungsten. A comparision was made between deposition size and probe size. It was observed that a nanometer sized dot was produced in less than 1 s. It was suggested that the size of the dots depended on probe size including the broadening in the substrate at a constant gas flux. It was found that by scanning the beam position rods, 8 nm diameter deposits could be produced at desired positions.

Original languageEnglish
Pages (from-to)742-746
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume22
Issue number2
Publication statusPublished - 2004 Mar
Externally publishedYes

Fingerprint

Field emission
Tungsten
field emission
tungsten
Electron microscopes
electron microscopes
Scanning
scanning
Electrons
Chemical vapor deposition
Electron beams
electrons
Deposits
Fluxes
probes
Substrates
Gases
rods
deposits
vapor deposition

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Surfaces and Interfaces
  • Physics and Astronomy (miscellaneous)

Cite this

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AU - Shimojo, Masayuki

AU - Mitsuishi, K.

AU - Tameike, A.

AU - Furuya, K.

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AB - Electron beam induced chemical vapor deposition (EBI-CVD) was carried out using field-emission gun scanning electron microscope (FE-SEM) and a field emission gun transmission electron microscope (FE-TEM) for nanodeposition of tungsten. A comparision was made between deposition size and probe size. It was observed that a nanometer sized dot was produced in less than 1 s. It was suggested that the size of the dots depended on probe size including the broadening in the substrate at a constant gas flux. It was found that by scanning the beam position rods, 8 nm diameter deposits could be produced at desired positions.

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