Electroplating of metal micro-structure using a resist micro-machined by proton beam writing

N. Uchiya, Y. Furuta, Hiroyuki Nishikawa, T. Watanabe, J. Haga, T. Satoh, M. Oikawa, T. Ohkubo, Y. Ishii, T. Kamiya

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The micro-structure of PMMA was successfully transcribed to the Ni structure as a reversal pattern. The PBW was useful method to obtain high-aspect-ratio metal micro-structures, coupled with the electroplating technique. Therefore, the PBW is a promising tool for fabrication of metal components such as a stamp for imprint lithography [6]. Imprinting using the 300-nm-thick Ni structure on PMMA was also demonstrated.

Original languageEnglish
Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC
Pages288-289
Number of pages2
DOIs
Publication statusPublished - 2007
Events20th International Microprocesses and Nanotechnology Conference, MNC 2007 - Kyoto
Duration: 2007 Nov 52007 Nov 8

Other

Others20th International Microprocesses and Nanotechnology Conference, MNC 2007
CityKyoto
Period07/11/507/11/8

Fingerprint

Proton beams
Electroplating
Microstructure
Metals
Lithography
Aspect ratio
Fabrication

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

Cite this

Uchiya, N., Furuta, Y., Nishikawa, H., Watanabe, T., Haga, J., Satoh, T., ... Kamiya, T. (2007). Electroplating of metal micro-structure using a resist micro-machined by proton beam writing. In Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC (pp. 288-289). [4456217] https://doi.org/10.1109/IMNC.2007.4456217

Electroplating of metal micro-structure using a resist micro-machined by proton beam writing. / Uchiya, N.; Furuta, Y.; Nishikawa, Hiroyuki; Watanabe, T.; Haga, J.; Satoh, T.; Oikawa, M.; Ohkubo, T.; Ishii, Y.; Kamiya, T.

Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC. 2007. p. 288-289 4456217.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Uchiya, N, Furuta, Y, Nishikawa, H, Watanabe, T, Haga, J, Satoh, T, Oikawa, M, Ohkubo, T, Ishii, Y & Kamiya, T 2007, Electroplating of metal micro-structure using a resist micro-machined by proton beam writing. in Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC., 4456217, pp. 288-289, s20th International Microprocesses and Nanotechnology Conference, MNC 2007, Kyoto, 07/11/5. https://doi.org/10.1109/IMNC.2007.4456217
Uchiya N, Furuta Y, Nishikawa H, Watanabe T, Haga J, Satoh T et al. Electroplating of metal micro-structure using a resist micro-machined by proton beam writing. In Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC. 2007. p. 288-289. 4456217 https://doi.org/10.1109/IMNC.2007.4456217
Uchiya, N. ; Furuta, Y. ; Nishikawa, Hiroyuki ; Watanabe, T. ; Haga, J. ; Satoh, T. ; Oikawa, M. ; Ohkubo, T. ; Ishii, Y. ; Kamiya, T. / Electroplating of metal micro-structure using a resist micro-machined by proton beam writing. Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC. 2007. pp. 288-289
@inproceedings{f386472ec2eb4ef58865a4b017432857,
title = "Electroplating of metal micro-structure using a resist micro-machined by proton beam writing",
abstract = "The micro-structure of PMMA was successfully transcribed to the Ni structure as a reversal pattern. The PBW was useful method to obtain high-aspect-ratio metal micro-structures, coupled with the electroplating technique. Therefore, the PBW is a promising tool for fabrication of metal components such as a stamp for imprint lithography [6]. Imprinting using the 300-nm-thick Ni structure on PMMA was also demonstrated.",
author = "N. Uchiya and Y. Furuta and Hiroyuki Nishikawa and T. Watanabe and J. Haga and T. Satoh and M. Oikawa and T. Ohkubo and Y. Ishii and T. Kamiya",
year = "2007",
doi = "10.1109/IMNC.2007.4456217",
language = "English",
isbn = "4990247248",
pages = "288--289",
booktitle = "Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC",

}

TY - GEN

T1 - Electroplating of metal micro-structure using a resist micro-machined by proton beam writing

AU - Uchiya, N.

AU - Furuta, Y.

AU - Nishikawa, Hiroyuki

AU - Watanabe, T.

AU - Haga, J.

AU - Satoh, T.

AU - Oikawa, M.

AU - Ohkubo, T.

AU - Ishii, Y.

AU - Kamiya, T.

PY - 2007

Y1 - 2007

N2 - The micro-structure of PMMA was successfully transcribed to the Ni structure as a reversal pattern. The PBW was useful method to obtain high-aspect-ratio metal micro-structures, coupled with the electroplating technique. Therefore, the PBW is a promising tool for fabrication of metal components such as a stamp for imprint lithography [6]. Imprinting using the 300-nm-thick Ni structure on PMMA was also demonstrated.

AB - The micro-structure of PMMA was successfully transcribed to the Ni structure as a reversal pattern. The PBW was useful method to obtain high-aspect-ratio metal micro-structures, coupled with the electroplating technique. Therefore, the PBW is a promising tool for fabrication of metal components such as a stamp for imprint lithography [6]. Imprinting using the 300-nm-thick Ni structure on PMMA was also demonstrated.

UR - http://www.scopus.com/inward/record.url?scp=47349119042&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=47349119042&partnerID=8YFLogxK

U2 - 10.1109/IMNC.2007.4456217

DO - 10.1109/IMNC.2007.4456217

M3 - Conference contribution

SN - 4990247248

SN - 9784990247249

SP - 288

EP - 289

BT - Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC

ER -