Electroplating using high-aspect-ratio microstructures fabricated by proton beam writing

Y. Seki, Y. Furuta, Hiroyuki Nishikawa, T. Watanabe, T. Nakata, T. Satoh, Y. Ishii, T. Kamiya

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

Proton beam writing (PBW) is one of the direct write techniques for the purpose of deep micromachining. Together with the flexibility of the direct write feature, micromachining of high-aspect-ratio structures is possible due to the straight trajectory of the MeV energy protons. However, direct writing is a low throughput process, when compared with a mask process such as UV lithography. For better productivity, coupled use of PBW with electroplating has been proposed as a method to fabricate metal microstructures for molds of imprint lithography. We demonstrate the electroplating of high-aspect-ratio Ni microstructures on PMMA micromachined by PBW.

Original languageEnglish
Pages (from-to)945-948
Number of pages4
JournalMicroelectronic Engineering
Volume86
Issue number4-6
DOIs
Publication statusPublished - 2009 Apr

Fingerprint

Proton beams
electroplating
Electroplating
high aspect ratio
proton beams
Aspect ratio
Micromachining
micromachining
Lithography
microstructure
Microstructure
lithography
Molds
Polymethyl Methacrylate
proton energy
productivity
Protons
Masks
flexibility
masks

Keywords

  • Electroplating
  • Microstructures
  • PMMA
  • Proton beam writing

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics

Cite this

Electroplating using high-aspect-ratio microstructures fabricated by proton beam writing. / Seki, Y.; Furuta, Y.; Nishikawa, Hiroyuki; Watanabe, T.; Nakata, T.; Satoh, T.; Ishii, Y.; Kamiya, T.

In: Microelectronic Engineering, Vol. 86, No. 4-6, 04.2009, p. 945-948.

Research output: Contribution to journalArticle

Seki, Y, Furuta, Y, Nishikawa, H, Watanabe, T, Nakata, T, Satoh, T, Ishii, Y & Kamiya, T 2009, 'Electroplating using high-aspect-ratio microstructures fabricated by proton beam writing', Microelectronic Engineering, vol. 86, no. 4-6, pp. 945-948. https://doi.org/10.1016/j.mee.2009.01.013
Seki, Y. ; Furuta, Y. ; Nishikawa, Hiroyuki ; Watanabe, T. ; Nakata, T. ; Satoh, T. ; Ishii, Y. ; Kamiya, T. / Electroplating using high-aspect-ratio microstructures fabricated by proton beam writing. In: Microelectronic Engineering. 2009 ; Vol. 86, No. 4-6. pp. 945-948.
@article{ce6b6e0359ae4e0d8036d1eeef7311f7,
title = "Electroplating using high-aspect-ratio microstructures fabricated by proton beam writing",
abstract = "Proton beam writing (PBW) is one of the direct write techniques for the purpose of deep micromachining. Together with the flexibility of the direct write feature, micromachining of high-aspect-ratio structures is possible due to the straight trajectory of the MeV energy protons. However, direct writing is a low throughput process, when compared with a mask process such as UV lithography. For better productivity, coupled use of PBW with electroplating has been proposed as a method to fabricate metal microstructures for molds of imprint lithography. We demonstrate the electroplating of high-aspect-ratio Ni microstructures on PMMA micromachined by PBW.",
keywords = "Electroplating, Microstructures, PMMA, Proton beam writing",
author = "Y. Seki and Y. Furuta and Hiroyuki Nishikawa and T. Watanabe and T. Nakata and T. Satoh and Y. Ishii and T. Kamiya",
year = "2009",
month = "4",
doi = "10.1016/j.mee.2009.01.013",
language = "English",
volume = "86",
pages = "945--948",
journal = "Microelectronic Engineering",
issn = "0167-9317",
publisher = "Elsevier",
number = "4-6",

}

TY - JOUR

T1 - Electroplating using high-aspect-ratio microstructures fabricated by proton beam writing

AU - Seki, Y.

AU - Furuta, Y.

AU - Nishikawa, Hiroyuki

AU - Watanabe, T.

AU - Nakata, T.

AU - Satoh, T.

AU - Ishii, Y.

AU - Kamiya, T.

PY - 2009/4

Y1 - 2009/4

N2 - Proton beam writing (PBW) is one of the direct write techniques for the purpose of deep micromachining. Together with the flexibility of the direct write feature, micromachining of high-aspect-ratio structures is possible due to the straight trajectory of the MeV energy protons. However, direct writing is a low throughput process, when compared with a mask process such as UV lithography. For better productivity, coupled use of PBW with electroplating has been proposed as a method to fabricate metal microstructures for molds of imprint lithography. We demonstrate the electroplating of high-aspect-ratio Ni microstructures on PMMA micromachined by PBW.

AB - Proton beam writing (PBW) is one of the direct write techniques for the purpose of deep micromachining. Together with the flexibility of the direct write feature, micromachining of high-aspect-ratio structures is possible due to the straight trajectory of the MeV energy protons. However, direct writing is a low throughput process, when compared with a mask process such as UV lithography. For better productivity, coupled use of PBW with electroplating has been proposed as a method to fabricate metal microstructures for molds of imprint lithography. We demonstrate the electroplating of high-aspect-ratio Ni microstructures on PMMA micromachined by PBW.

KW - Electroplating

KW - Microstructures

KW - PMMA

KW - Proton beam writing

UR - http://www.scopus.com/inward/record.url?scp=67349129376&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=67349129376&partnerID=8YFLogxK

U2 - 10.1016/j.mee.2009.01.013

DO - 10.1016/j.mee.2009.01.013

M3 - Article

AN - SCOPUS:67349129376

VL - 86

SP - 945

EP - 948

JO - Microelectronic Engineering

JF - Microelectronic Engineering

SN - 0167-9317

IS - 4-6

ER -