Etching method for fabricating ultracompact three-dimensional monolithic microwave integrated circuits

Suehiro Sugitani, Kiyomitsu Onodera, Shinji Aoyama, Makoto Hirano, Masami Tokumitsu

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The fabrication of ultracompact three dimensional monolithic microwave circuits (MMIC) having a sophisticated three-dimensional (3D) interconnection structure was discussed. The circuits were manufactured using the inductively coupled plasma etching with a double-layer mask, consisting of WSi covered with photoresists containing silicon. The developed method enabled the formation of holes to any levels of interconnections simultaneously. It resulted in smaller chip area, higher performance and greater design flexibility in MMICs.

Original languageEnglish
Pages (from-to)1019-1025
Number of pages7
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume20
Issue number3
DOIs
Publication statusPublished - 2002 May
Externally publishedYes

Fingerprint

Microwave circuits
microwave circuits
Plasma etching
Monolithic microwave integrated circuits
Inductively coupled plasma
Photoresists
integrated circuits
Masks
Etching
etching
Fabrication
Silicon
Networks (circuits)
plasma etching
photoresists
flexibility
masks
chips
fabrication
silicon

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Surfaces and Interfaces
  • Physics and Astronomy (miscellaneous)

Cite this

Etching method for fabricating ultracompact three-dimensional monolithic microwave integrated circuits. / Sugitani, Suehiro; Onodera, Kiyomitsu; Aoyama, Shinji; Hirano, Makoto; Tokumitsu, Masami.

In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 20, No. 3, 05.2002, p. 1019-1025.

Research output: Contribution to journalArticle

Sugitani, Suehiro ; Onodera, Kiyomitsu ; Aoyama, Shinji ; Hirano, Makoto ; Tokumitsu, Masami. / Etching method for fabricating ultracompact three-dimensional monolithic microwave integrated circuits. In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2002 ; Vol. 20, No. 3. pp. 1019-1025.
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