Evaluation of silica glasses implanted by high-energy ions using a uv-excited microscopy

T. Yamaguchi, E. Watanabe, T. Souno, H. Nishikawa, M. Hattori, Y. Ohki, T. Kamiya, K. Arakawa

Research output: Contribution to journalArticle

Original languageEnglish
JournalAbstracts of Radiation Effects in Insulators
Publication statusPublished - 2001 Sep 3

Cite this

Evaluation of silica glasses implanted by high-energy ions using a uv-excited microscopy. / Yamaguchi, T.; Watanabe, E.; Souno, T.; Nishikawa, H.; Hattori, M.; Ohki, Y.; Kamiya, T.; Arakawa, K.

In: Abstracts of Radiation Effects in Insulators, 03.09.2001.

Research output: Contribution to journalArticle

Yamaguchi, T. ; Watanabe, E. ; Souno, T. ; Nishikawa, H. ; Hattori, M. ; Ohki, Y. ; Kamiya, T. ; Arakawa, K. / Evaluation of silica glasses implanted by high-energy ions using a uv-excited microscopy. In: Abstracts of Radiation Effects in Insulators. 2001.
@article{1993d7dc2b534e4a9b8373b6df193678,
title = "Evaluation of silica glasses implanted by high-energy ions using a uv-excited microscopy",
author = "T. Yamaguchi and E. Watanabe and T. Souno and H. Nishikawa and M. Hattori and Y. Ohki and T. Kamiya and K. Arakawa",
year = "2001",
month = "9",
day = "3",
language = "English",
journal = "Abstracts of Radiation Effects in Insulators",

}

TY - JOUR

T1 - Evaluation of silica glasses implanted by high-energy ions using a uv-excited microscopy

AU - Yamaguchi, T.

AU - Watanabe, E.

AU - Souno, T.

AU - Nishikawa, H.

AU - Hattori, M.

AU - Ohki, Y.

AU - Kamiya, T.

AU - Arakawa, K.

PY - 2001/9/3

Y1 - 2001/9/3

M3 - Article

JO - Abstracts of Radiation Effects in Insulators

JF - Abstracts of Radiation Effects in Insulators

ER -