Abstract
SiO2 films were prepared by the sol-gel method using photoirradiation, and the properties microhardness and HF etch rate, etc., were evaluated. The hardness and anti-corrosion in HF of photoirradiated films were superior to films only heated at the same temperature.
| Original language | English |
|---|---|
| Pages (from-to) | 207-209 |
| Number of pages | 3 |
| Journal | Journal of Non-Crystalline Solids |
| Volume | 169 |
| Issue number | 1-2 |
| DOIs | |
| Publication status | Published - 1994 Mar 11 |
| Externally published | Yes |
Fingerprint
ASJC Scopus subject areas
- Ceramics and Composites
- Electronic, Optical and Magnetic Materials
Cite this
Evaluation of SiO2 thin films prepared by sol-gel method using photoirradiation. / Maekawa, S.; Ohishi, Tomoji.
In: Journal of Non-Crystalline Solids, Vol. 169, No. 1-2, 11.03.1994, p. 207-209.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Evaluation of SiO2 thin films prepared by sol-gel method using photoirradiation
AU - Maekawa, S.
AU - Ohishi, Tomoji
PY - 1994/3/11
Y1 - 1994/3/11
N2 - SiO2 films were prepared by the sol-gel method using photoirradiation, and the properties microhardness and HF etch rate, etc., were evaluated. The hardness and anti-corrosion in HF of photoirradiated films were superior to films only heated at the same temperature.
AB - SiO2 films were prepared by the sol-gel method using photoirradiation, and the properties microhardness and HF etch rate, etc., were evaluated. The hardness and anti-corrosion in HF of photoirradiated films were superior to films only heated at the same temperature.
UR - http://www.scopus.com/inward/record.url?scp=0028760375&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0028760375&partnerID=8YFLogxK
U2 - 10.1016/0022-3093(94)90241-0
DO - 10.1016/0022-3093(94)90241-0
M3 - Article
VL - 169
SP - 207
EP - 209
JO - Journal of Non-Crystalline Solids
JF - Journal of Non-Crystalline Solids
SN - 0022-3093
IS - 1-2
ER -