Evaluation of SiO2 thin films prepared by sol-gel method using photoirradiation

S. Maekawa, Tomoji Ohishi

Research output: Contribution to journalArticle

30 Citations (Scopus)

Abstract

SiO2 films were prepared by the sol-gel method using photoirradiation, and the properties microhardness and HF etch rate, etc., were evaluated. The hardness and anti-corrosion in HF of photoirradiated films were superior to films only heated at the same temperature.

Original languageEnglish
Pages (from-to)207-209
Number of pages3
JournalJournal of Non-Crystalline Solids
Volume169
Issue number1-2
DOIs
Publication statusPublished - 1994 Mar 11
Externally publishedYes

Fingerprint

Sol-gel process
gels
Thin films
evaluation
thin films
Microhardness
microhardness
corrosion
hardness
Hardness
Corrosion
Temperature
temperature

ASJC Scopus subject areas

  • Ceramics and Composites
  • Electronic, Optical and Magnetic Materials

Cite this

Evaluation of SiO2 thin films prepared by sol-gel method using photoirradiation. / Maekawa, S.; Ohishi, Tomoji.

In: Journal of Non-Crystalline Solids, Vol. 169, No. 1-2, 11.03.1994, p. 207-209.

Research output: Contribution to journalArticle

@article{6f88f7812c374429a3598d218f411de2,
title = "Evaluation of SiO2 thin films prepared by sol-gel method using photoirradiation",
abstract = "SiO2 films were prepared by the sol-gel method using photoirradiation, and the properties microhardness and HF etch rate, etc., were evaluated. The hardness and anti-corrosion in HF of photoirradiated films were superior to films only heated at the same temperature.",
author = "S. Maekawa and Tomoji Ohishi",
year = "1994",
month = "3",
day = "11",
doi = "10.1016/0022-3093(94)90241-0",
language = "English",
volume = "169",
pages = "207--209",
journal = "Journal of Non-Crystalline Solids",
issn = "0022-3093",
publisher = "Elsevier",
number = "1-2",

}

TY - JOUR

T1 - Evaluation of SiO2 thin films prepared by sol-gel method using photoirradiation

AU - Maekawa, S.

AU - Ohishi, Tomoji

PY - 1994/3/11

Y1 - 1994/3/11

N2 - SiO2 films were prepared by the sol-gel method using photoirradiation, and the properties microhardness and HF etch rate, etc., were evaluated. The hardness and anti-corrosion in HF of photoirradiated films were superior to films only heated at the same temperature.

AB - SiO2 films were prepared by the sol-gel method using photoirradiation, and the properties microhardness and HF etch rate, etc., were evaluated. The hardness and anti-corrosion in HF of photoirradiated films were superior to films only heated at the same temperature.

UR - http://www.scopus.com/inward/record.url?scp=0028760375&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0028760375&partnerID=8YFLogxK

U2 - 10.1016/0022-3093(94)90241-0

DO - 10.1016/0022-3093(94)90241-0

M3 - Article

VL - 169

SP - 207

EP - 209

JO - Journal of Non-Crystalline Solids

JF - Journal of Non-Crystalline Solids

SN - 0022-3093

IS - 1-2

ER -