Abstract
SiO2 films were prepared by the sol-gel method using photoirradiation, and the properties microhardness and HF etch rate, etc., were evaluated. The hardness and anti-corrosion in HF of photoirradiated films were superior to films only heated at the same temperature.
Original language | English |
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Pages (from-to) | 207-209 |
Number of pages | 3 |
Journal | Journal of Non-Crystalline Solids |
Volume | 169 |
Issue number | 1-2 |
DOIs | |
Publication status | Published - 1994 Mar 11 |
Externally published | Yes |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Ceramics and Composites
- Condensed Matter Physics
- Materials Chemistry