Evaluations of electrical properties for ZnTe thin films electrodeposited from a citric acid bath with a hall effect measurement

Takeshi Ohtomo, Takahiro Ishizaki, Daisuke Ogiwara, Hiroshi Kawarada, Akio Fuwa

Research output: Contribution to journalArticle


ZnTe thin films were electrochemically deposited onto Au-coated Cu substrates from an electrolytic solution containing ZnSO 4, TeO 2, citric acid and sodium citrate. Effects of deposition potentials and solution's Zn concentrations on the structure, chemical composition and electrical property were investigated. The resistivity, conduction type, carrier density, and carrier mobility were evaluated with a Hall effect measurement apparatus. A film with nearly stoichiometric composition was deposited at - 0.80 V vs. Ag /AgCl at 353 K from a solution containing 2.0 × 10 -2 kmol m -3-ZnSO 4, 1.0 × 10 -4 kmol m -3-TeO 2, 9.0 × 10 -2 kmol m -3-citric acid and 2.1 × 10 -1 kmol m -3-sodium citrate and was well crystallized with cubic preferential orientation along the (111) plane. A resistivity, the carrier density and the carrier mobility were 4.1 × 10 2 Ωm, 2.9 × 10 19 m -3 and 5.3 × 10 -4 m 2 V-1 s -1, respectively.

Original languageEnglish
Pages (from-to)298-302
Number of pages5
JournalNippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals
Issue number3
Publication statusPublished - 2005 Mar
Externally publishedYes



  • Citric acid
  • Electrical property
  • Electrodeposition
  • Hall effect
  • Zinc telluride

ASJC Scopus subject areas

  • Metals and Alloys

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