Fabrication and direct transmission measurement of high-aspect-ratio two-dimensional silicon-based photonic crystal chips

Ying Xu, Hong Bo Sun, Jia Yu Ye, Shigeki Matsuo, Hiroaki Misawa

Research output: Contribution to journalArticle

40 Citations (Scopus)

Abstract

We report the fabrication and characterization of two-dimensional silicon-based photonic crystal (PhC) structures realized by a combination of electron-beam lithography and dry-etching techniques. PhCs of various lattices with very high aspect ratios up to 20 have been achieved, and PhC chips were prepared by standard semiconductor technologies, including thinning and cleaving. The chips consisting of high-aspect-ratio air rods or dielectric rods permit a direct transmission measurement, and they were observed to demonstrate pronounced photonic bandgap effects. Several photonic bandgap behaviors were identified by comparing transmission with reflection and experimental results with numerical results, and by considering detecting beam property.

Original languageEnglish
Pages (from-to)1084-1091
Number of pages8
JournalJournal of the Optical Society of America B: Optical Physics
Volume18
Issue number8
Publication statusPublished - 2001
Externally publishedYes

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high aspect ratio
chips
photonics
fabrication
silicon
crystals
rods
lithography
etching
electron beams
crystal structure
air

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

Fabrication and direct transmission measurement of high-aspect-ratio two-dimensional silicon-based photonic crystal chips. / Xu, Ying; Sun, Hong Bo; Ye, Jia Yu; Matsuo, Shigeki; Misawa, Hiroaki.

In: Journal of the Optical Society of America B: Optical Physics, Vol. 18, No. 8, 2001, p. 1084-1091.

Research output: Contribution to journalArticle

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