TY - JOUR
T1 - Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography
AU - Puttaraksa, Nitipon
AU - Unai, Somrit
AU - Rhodes, Michael W.
AU - Singkarat, Kanda
AU - Whitlow, Harry J.
AU - Singkarat, Somsorn
N1 - Funding Information:
This work was supported in part by the CoE Program of Chiang Mai University (CMU) and the International Atomic Energy Agency (IAEA, Vienna). NP gratefully acknowledges financial support from the Royal Golden Jubilee Scholarship of the Thailand Research Fund and also would like to thank the Thailand Center of Excellence in Physics (ThEP Center), the Department of Physics and Materials Science, and the Graduate School of CMU for his traveling expenses. The Academy of Finland, Centre of Excellence in Nuclear and Accelerator Based Physics , ref. 213503 and grant 129999 supported the work of NP and HJW’s travel was supported by the Magnus Erhnrooth Foundation. SU is supported by the ThEP Center scholarship. Mr. Chome Thongleurm and Mr. Witoon Ginamoon are also acknowledged for their technical support.
PY - 2012/2/1
Y1 - 2012/2/1
N2 - In this study, poly(methyl methacrylate) (PMMA) was investigated as a negative resist by irradiation with a high-fluence 2 MeV proton beam. The beam from a 1.7 MV Tandetron accelerator at the Plasma and Beam Physics Research Facility (PBP) of Chiang Mai University is shaped by a pair of computer-controlled L-shaped apertures which are used to expose rectangular pattern elements with 1-1000 μm side length. Repeated exposure of rectangular pattern elements allows a complex pattern to be built up. After subsequent development, the negative PMMA microstructure was used as a master mold for casting poly(dimethylsiloxane) (PDMS) following a standard soft-lithography process. The PDMS chip fabricated by this technique was demonstrated to be a microfluidic device.
AB - In this study, poly(methyl methacrylate) (PMMA) was investigated as a negative resist by irradiation with a high-fluence 2 MeV proton beam. The beam from a 1.7 MV Tandetron accelerator at the Plasma and Beam Physics Research Facility (PBP) of Chiang Mai University is shaped by a pair of computer-controlled L-shaped apertures which are used to expose rectangular pattern elements with 1-1000 μm side length. Repeated exposure of rectangular pattern elements allows a complex pattern to be built up. After subsequent development, the negative PMMA microstructure was used as a master mold for casting poly(dimethylsiloxane) (PDMS) following a standard soft-lithography process. The PDMS chip fabricated by this technique was demonstrated to be a microfluidic device.
KW - MeV ion beam lithography
KW - PDMS
KW - Soft-lithography
UR - http://www.scopus.com/inward/record.url?scp=84655170025&partnerID=8YFLogxK
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U2 - 10.1016/j.nimb.2011.01.053
DO - 10.1016/j.nimb.2011.01.053
M3 - Article
AN - SCOPUS:84655170025
VL - 272
SP - 149
EP - 152
JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
SN - 0168-583X
ER -