Fabrication of Bi2SiO5 Thin Films for MFIS Structures

M.Yamaguchi M.Yamaguchi, K.Hiraki K.Hiraki, T.Homma T.Homma, T.Nagatomo T.Nagatomo, Y.Masuda Y.Masuda, Tetsuya Homma

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)629-632
JournalProceedings of 12th International Symposium on the Application of Ferroelectrics(ISAF)
VolumeII
Publication statusPublished - 2001 Mar 1

Cite this

M.Yamaguchi, M. Y., K.Hiraki, K. H., T.Homma, T. H., T.Nagatomo, T. N., Y.Masuda, Y. M., & Homma, T. (2001). Fabrication of Bi2SiO5 Thin Films for MFIS Structures. Proceedings of 12th International Symposium on the Application of Ferroelectrics(ISAF), II, 629-632.