Fabrication of BIT thick films patterned by proton beam writing

Masaki Yamaguchi, Kazuki Watanabe, Hiroyuki Nishikawa, Yoichiro Masuda

Research output: Research - peer-reviewArticle

Abstract

In this study, we fabricated thick films with polyvinylpyrrolidone (PVP) added to bismuth titanate (Bi4Ti3O12) to form a lead-free ferroelectric material. We examined the direct patterning of these materials by using proton-beam irradiation. When 50% PVP was added to the organic source solution, the c-axis orientation was promoted and cracks were suppressed due to stress relaxation. In addition, a dot and an arbitrary-shape micro-pattern were formed on bismuth-titanate thick film by micromachining using a proton beam.

LanguageEnglish
Pages88-91
Number of pages4
JournalJournal of the Korean Physical Society
Volume71
Issue number2
DOIs
StatePublished - 2017 Jul 1

Fingerprint

proton beams
bismuth
thick films
fabrication
ferroelectric materials
stress relaxation
micromachining
cracks
irradiation

Keywords

  • Ferroelectricity
  • Micropatterning
  • Proton beam writing
  • Thick-film formation

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Fabrication of BIT thick films patterned by proton beam writing. / Yamaguchi, Masaki; Watanabe, Kazuki; Nishikawa, Hiroyuki; Masuda, Yoichiro.

In: Journal of the Korean Physical Society, Vol. 71, No. 2, 01.07.2017, p. 88-91.

Research output: Research - peer-reviewArticle

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AB - In this study, we fabricated thick films with polyvinylpyrrolidone (PVP) added to bismuth titanate (Bi4Ti3O12) to form a lead-free ferroelectric material. We examined the direct patterning of these materials by using proton-beam irradiation. When 50% PVP was added to the organic source solution, the c-axis orientation was promoted and cracks were suppressed due to stress relaxation. In addition, a dot and an arbitrary-shape micro-pattern were formed on bismuth-titanate thick film by micromachining using a proton beam.

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