Fabrication of Electroless CoWP/NiB Barrier Layer on SiO2 for ULSI Devices

T. Osaka, H. Aramak, M. Yoshino, K. Ueno, I. Matsuda, Y. Shacham-Diam

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)H707-H710
JournalJournal of the Electrochemical Society
Volume156
Publication statusPublished - 2009 Sep 1

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Osaka, T., Aramak, H., Yoshino, M., Ueno, K., Matsuda, I., & Shacham-Diam, Y. (2009). Fabrication of Electroless CoWP/NiB Barrier Layer on SiO2 for ULSI Devices. Journal of the Electrochemical Society, 156, H707-H710.