Fabrication of electroless CoWP/NiB diffusion barrier layer on SiO 2 for ULSI Devices

Tetsuya Osaka, Hitoshi Aramaki, Masahiro Yoshino, Kazuyoshi Ueno, Itsuaki Matsuda, Yosi Shacham-Diamand

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21 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds