Fabrication of electroless NiRe barrier layer on SiO2 without sputtered seed layer

T.Osaka T.Osaka, N.Takano N.Takano, T.Kurokawa T.Kurokawa, K.Ueno K.Ueno, Kazuyoshi Ueno

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)7-10
JournalElectrochemical and Solid State Letters
Volume5(1)
Publication statusPublished - 2002 Jan 1

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T.Osaka, T. O., N.Takano, N. T., T.Kurokawa, T. K., K.Ueno, K. U., & Ueno, K. (2002). Fabrication of electroless NiRe barrier layer on SiO2 without sputtered seed layer. Electrochemical and Solid State Letters, 5(1), 7-10.