Fabrication of high-aspect-ratio pillars by proton beam writing and application to DEP-devices

Y. Furuta, N. Uchiya, Hiroyuki Nishikawa, J. Haga, M. Oikawa, T. Satoh, Y. Ishii, T. Kamiya, R. Nakao, S. Uchida

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)

Abstract

Figures 1 (a), (b) and (c) show SEM images of 21 μm thick SU-8 pillars on silicon developed after PBW. These data demonstrate a capability of PBW to fabricate vertical pillars with a height of 21.0 μm and a width of as small as 1.1 μm with a high aspect ratio of 20, with a uniformity over 700 μm squared area. An optical microscope image in Figure 2 shows a part of a DEP device, where the high-aspect-ratio SU-8 pillars with a 12 μm pitch were formed in the gap between the two surface electrodes. Our preliminary investigation shows that Escherichia coli can be trapped at pillar structures under AC bias (3 volts, 100 kHz) of the two electrodes. The trapping behavior of DEP device with different structures and sizes will be examined.

Original languageEnglish
Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC
Pages340-341
Number of pages2
DOIs
Publication statusPublished - 2007
Events20th International Microprocesses and Nanotechnology Conference, MNC 2007 - Kyoto
Duration: 2007 Nov 52007 Nov 8

Other

Others20th International Microprocesses and Nanotechnology Conference, MNC 2007
CityKyoto
Period07/11/507/11/8

Fingerprint

Proton beams
Aspect ratio
Fabrication
Electrodes
Escherichia coli
Microscopes
Silicon
Scanning electron microscopy

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

Cite this

Furuta, Y., Uchiya, N., Nishikawa, H., Haga, J., Oikawa, M., Satoh, T., ... Uchida, S. (2007). Fabrication of high-aspect-ratio pillars by proton beam writing and application to DEP-devices. In Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC (pp. 340-341). [4456243] https://doi.org/10.1109/IMNC.2007.4456243

Fabrication of high-aspect-ratio pillars by proton beam writing and application to DEP-devices. / Furuta, Y.; Uchiya, N.; Nishikawa, Hiroyuki; Haga, J.; Oikawa, M.; Satoh, T.; Ishii, Y.; Kamiya, T.; Nakao, R.; Uchida, S.

Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC. 2007. p. 340-341 4456243.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Furuta, Y, Uchiya, N, Nishikawa, H, Haga, J, Oikawa, M, Satoh, T, Ishii, Y, Kamiya, T, Nakao, R & Uchida, S 2007, Fabrication of high-aspect-ratio pillars by proton beam writing and application to DEP-devices. in Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC., 4456243, pp. 340-341, s20th International Microprocesses and Nanotechnology Conference, MNC 2007, Kyoto, 07/11/5. https://doi.org/10.1109/IMNC.2007.4456243
Furuta Y, Uchiya N, Nishikawa H, Haga J, Oikawa M, Satoh T et al. Fabrication of high-aspect-ratio pillars by proton beam writing and application to DEP-devices. In Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC. 2007. p. 340-341. 4456243 https://doi.org/10.1109/IMNC.2007.4456243
Furuta, Y. ; Uchiya, N. ; Nishikawa, Hiroyuki ; Haga, J. ; Oikawa, M. ; Satoh, T. ; Ishii, Y. ; Kamiya, T. ; Nakao, R. ; Uchida, S. / Fabrication of high-aspect-ratio pillars by proton beam writing and application to DEP-devices. Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC. 2007. pp. 340-341
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