Fabrication of high-aspect-ratio PZT thick film structure using sol-gel technique and SU-8 photoresist

Nobuyuki Futai, Kiyoshi Matsumoto, Isao Shimoyama

Research output: Chapter in Book/Report/Conference proceedingConference contribution

7 Citations (Scopus)

Abstract

An optimized sol-gel process and an SU-8 photoresist were used to produce thick and high-aspect-ratio lead zirconate titanate (PZT) structures on platinized silicon substrates. The fabrication process involved single coating, lapping of the gel, and rapid firing. The PZT structures made with this new process were crack-free and had good crystallinity. Their XRD patterns and ferroelectric properties showed that the structures were high quality PZT. Values of relative permittivity and dielectric loss of the PZT were over 300 and 0.03, respectively. The structures had thickness of 20 μm or higher, and had aspect ratio of over one.

Original languageEnglish
Title of host publicationProceedings of the IEEE Micro Electro Mechanical Systems (MEMS)
Pages168-171
Number of pages4
Publication statusPublished - 2002
Externally publishedYes
Event15th IEEE International Conference on Micro Electro Mechanical Systems MEMS 2002 - Las Vegas, NV
Duration: 2002 Jan 202002 Jan 24

Other

Other15th IEEE International Conference on Micro Electro Mechanical Systems MEMS 2002
CityLas Vegas, NV
Period02/1/2002/1/24

Fingerprint

Photoresists
Thick films
Sol-gels
Aspect ratio
Fabrication
Lapping
Dielectric losses
Sol-gel process
Ferroelectric materials
Permittivity
Gels
Cracks
Silicon
Coatings
Substrates

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Electrical and Electronic Engineering
  • Mechanical Engineering

Cite this

Futai, N., Matsumoto, K., & Shimoyama, I. (2002). Fabrication of high-aspect-ratio PZT thick film structure using sol-gel technique and SU-8 photoresist. In Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS) (pp. 168-171)

Fabrication of high-aspect-ratio PZT thick film structure using sol-gel technique and SU-8 photoresist. / Futai, Nobuyuki; Matsumoto, Kiyoshi; Shimoyama, Isao.

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS). 2002. p. 168-171.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Futai, N, Matsumoto, K & Shimoyama, I 2002, Fabrication of high-aspect-ratio PZT thick film structure using sol-gel technique and SU-8 photoresist. in Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS). pp. 168-171, 15th IEEE International Conference on Micro Electro Mechanical Systems MEMS 2002, Las Vegas, NV, 02/1/20.
Futai N, Matsumoto K, Shimoyama I. Fabrication of high-aspect-ratio PZT thick film structure using sol-gel technique and SU-8 photoresist. In Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS). 2002. p. 168-171
Futai, Nobuyuki ; Matsumoto, Kiyoshi ; Shimoyama, Isao. / Fabrication of high-aspect-ratio PZT thick film structure using sol-gel technique and SU-8 photoresist. Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS). 2002. pp. 168-171
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