Fabrication of nanowires by varying energy microbeam lithography using heavy ions at the TIARA

T. Kamiya; K. Takano; Y. Ishii; T. Satoh; M. Oikawa; T. Ohkubo; J. Haga; H. Nishikawa; Y. Furuta; N. Uchiya; S. Seki; M. Sugimoto

doi:10.1016/j.nimb.2009.03.043

Fabrication of nanowires by varying energy microbeam lithography using heavy ions at the TIARA

T. Kamiya, K. Takano, Y. Ishii, T. Satoh, M. Oikawa, T. Ohkubo, J. Haga, H. Nishikawa, Y. Furuta, N. Uchiya, S. Seki, M. Sugimoto

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

In TIARA facility of Japan Atomic Energy Agency (JAEA) Takasaki, we have produced three-dimensional micro/nano-structures with high aspect ratio using cross linking process based on negative resist such as SU-8 by a technique of mask less ion beam lithography. By bombarding high energy heavy ions such as 450 MeV Xe²³⁺ to SU-8, on the other hand, it appeared that a nanowire could be produced just with a single ion hitting. Then we tried to produce nanowires, of which both ends were fixed in the three-dimensional structure. This paper shows a preliminary experiment for this purpose using a combination of 15 MeV Ni⁴⁺ ion microbeam patterning and the 450 MeV ¹²⁹Xe²³⁺ hitting on SU-8.

Original language	English
Pages (from-to)	2317-2320
Number of pages	4
Journal	Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume	267
Issue number	12-13
DOIs	https://doi.org/10.1016/j.nimb.2009.03.043
Publication status	Published - 2009 Jun 15

Keywords

High aspect ratio
Ion microbeam systems
Lithography
Nanowires
Three-dimensional structure

ASJC Scopus subject areas

Nuclear and High Energy Physics
Instrumentation

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10.1016/j.nimb.2009.03.043

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Kamiya, T., Takano, K., Ishii, Y., Satoh, T., Oikawa, M., Ohkubo, T., Haga, J., Nishikawa, H., Furuta, Y., Uchiya, N., Seki, S., & Sugimoto, M. (2009). Fabrication of nanowires by varying energy microbeam lithography using heavy ions at the TIARA. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 267(12-13), 2317-2320. https://doi.org/10.1016/j.nimb.2009.03.043

Kamiya, T, Takano, K, Ishii, Y, Satoh, T, Oikawa, M, Ohkubo, T, Haga, J, Nishikawa, H, Furuta, Y, Uchiya, N, Seki, S & Sugimoto, M 2009, 'Fabrication of nanowires by varying energy microbeam lithography using heavy ions at the TIARA', Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, vol. 267, no. 12-13, pp. 2317-2320. https://doi.org/10.1016/j.nimb.2009.03.043

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title = "Fabrication of nanowires by varying energy microbeam lithography using heavy ions at the TIARA",

abstract = "In TIARA facility of Japan Atomic Energy Agency (JAEA) Takasaki, we have produced three-dimensional micro/nano-structures with high aspect ratio using cross linking process based on negative resist such as SU-8 by a technique of mask less ion beam lithography. By bombarding high energy heavy ions such as 450 MeV Xe23+ to SU-8, on the other hand, it appeared that a nanowire could be produced just with a single ion hitting. Then we tried to produce nanowires, of which both ends were fixed in the three-dimensional structure. This paper shows a preliminary experiment for this purpose using a combination of 15 MeV Ni4+ ion microbeam patterning and the 450 MeV 129Xe23+ hitting on SU-8.",

keywords = "High aspect ratio, Ion microbeam systems, Lithography, Nanowires, Three-dimensional structure",

author = "T. Kamiya and K. Takano and Y. Ishii and T. Satoh and M. Oikawa and T. Ohkubo and J. Haga and H. Nishikawa and Y. Furuta and N. Uchiya and S. Seki and M. Sugimoto",

note = "Funding Information: The authors would like to express their appreciation for the great cooperation obtained from all of the accelerator staff in TIARA in carrying out the present experiments. This research was partially supported by the Ministry of Education, Science, Sports and Culture, Grant-in-Aid for Scientific Research (A), 19206105, 2007 and Scientific Research (B), 17310085, 2007.",

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doi = "10.1016/j.nimb.2009.03.043",

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AU - Kamiya, T.

AU - Takano, K.

AU - Ishii, Y.

AU - Satoh, T.

AU - Oikawa, M.

AU - Ohkubo, T.

AU - Haga, J.

AU - Nishikawa, H.

AU - Furuta, Y.

AU - Uchiya, N.

AU - Seki, S.

AU - Sugimoto, M.

N1 - Funding Information: The authors would like to express their appreciation for the great cooperation obtained from all of the accelerator staff in TIARA in carrying out the present experiments. This research was partially supported by the Ministry of Education, Science, Sports and Culture, Grant-in-Aid for Scientific Research (A), 19206105, 2007 and Scientific Research (B), 17310085, 2007.

PY - 2009/6/15

Y1 - 2009/6/15

N2 - In TIARA facility of Japan Atomic Energy Agency (JAEA) Takasaki, we have produced three-dimensional micro/nano-structures with high aspect ratio using cross linking process based on negative resist such as SU-8 by a technique of mask less ion beam lithography. By bombarding high energy heavy ions such as 450 MeV Xe23+ to SU-8, on the other hand, it appeared that a nanowire could be produced just with a single ion hitting. Then we tried to produce nanowires, of which both ends were fixed in the three-dimensional structure. This paper shows a preliminary experiment for this purpose using a combination of 15 MeV Ni4+ ion microbeam patterning and the 450 MeV 129Xe23+ hitting on SU-8.

AB - In TIARA facility of Japan Atomic Energy Agency (JAEA) Takasaki, we have produced three-dimensional micro/nano-structures with high aspect ratio using cross linking process based on negative resist such as SU-8 by a technique of mask less ion beam lithography. By bombarding high energy heavy ions such as 450 MeV Xe23+ to SU-8, on the other hand, it appeared that a nanowire could be produced just with a single ion hitting. Then we tried to produce nanowires, of which both ends were fixed in the three-dimensional structure. This paper shows a preliminary experiment for this purpose using a combination of 15 MeV Ni4+ ion microbeam patterning and the 450 MeV 129Xe23+ hitting on SU-8.

KW - High aspect ratio

KW - Ion microbeam systems

KW - Lithography

KW - Nanowires

KW - Three-dimensional structure

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Fabrication of nanowires by varying energy microbeam lithography using heavy ions at the TIARA

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Keywords

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