Fabrication of patterned domains with graphitic clusters in amorphous carbon using a combination of ion implantation and electron irradiation techniques

Eiji Iwamura, Tatsuhiko Aizawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

Fabrication of domains containing graphitic structures in amorphous carbon (a-C) films was demonstrated. Amorphous carbon thin films with 200 nm thickness were deposited on Si substrates by ion-beam sputtering. Iron atoms in a range from 4×1013 to 3.7×1016 cm-2 were doped to the a-C films by an ion implantation technique through a nickel mask with a grid of square windows of 500×500 μm and a net of 50 μm in width as a template. After removing the metal mask, the partly Fe-containing a-C films were exposed to a low-energy electron shower. In the regions where Fe atoms were implanted, Fe were crystallized and preferably diffused toward the film surface leaving graphitic structures more than 10 nm in size in the interior of the amorphous carbon films. On the other hand, the masked regions, where Fe atoms were not implanted, remained amorphous. The results suggest that regions, which consist of amorphous domains and graphitic domains, can be intentionally arranged in a-C thin films.

Original languageEnglish
Title of host publicationGrowth, Modification and Analysis by Ion Beams at the Nanoscale
PublisherMaterials Research Society
Pages108-113
Number of pages6
ISBN (Print)1558998632, 9781558998636
DOIs
Publication statusPublished - 2005 Jan 1
Event2005 MRS Fall Meeting - Boston, MA, United States
Duration: 2005 Nov 282005 Dec 2

Publication series

NameMaterials Research Society Symposium Proceedings
Volume908
ISSN (Print)0272-9172

Conference

Conference2005 MRS Fall Meeting
CountryUnited States
CityBoston, MA
Period05/11/2805/12/2

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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  • Cite this

    Iwamura, E., & Aizawa, T. (2005). Fabrication of patterned domains with graphitic clusters in amorphous carbon using a combination of ion implantation and electron irradiation techniques. In Growth, Modification and Analysis by Ion Beams at the Nanoscale (pp. 108-113). (Materials Research Society Symposium Proceedings; Vol. 908). Materials Research Society. https://doi.org/10.1557/proc-0908-oo11-05