Fabrication of patterned domains with graphitic clusters in amorphous carbon using a combination of ion implantation and electron irradiation techniques

Eiji Iwamura, Tatsuhiko Aizawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

Fabrication of domains containing graphitic structures in amorphous carbon (a-C) films was demonstrated. Amorphous carbon thin films with 200 nm thickness were deposited on Si substrates by ion-beam sputtering. Iron atoms in a range from 4×1013 to 3.7×1016 cm-2 were doped to the a-C films by an ion implantation technique through a nickel mask with a grid of square windows of 500×500 μm and a net of 50 μm in width as a template. After removing the metal mask, the partly Fe-containing a-C films were exposed to a low-energy electron shower. In the regions where Fe atoms were implanted, Fe were crystallized and preferably diffused toward the film surface leaving graphitic structures more than 10 nm in size in the interior of the amorphous carbon films. On the other hand, the masked regions, where Fe atoms were not implanted, remained amorphous. The results suggest that regions, which consist of amorphous domains and graphitic domains, can be intentionally arranged in a-C thin films.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium Proceedings
Pages108-113
Number of pages6
Volume908
Publication statusPublished - 2005
Externally publishedYes
Event2005 MRS Fall Meeting - Boston, MA
Duration: 2005 Nov 282005 Dec 2

Other

Other2005 MRS Fall Meeting
CityBoston, MA
Period05/11/2805/12/2

Fingerprint

Electron irradiation
Carbon films
Amorphous carbon
Ion implantation
Amorphous films
Fabrication
Atoms
Masks
Thin films
Nickel
Ion beams
Sputtering
Iron
Metals
Electrons
Substrates

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Iwamura, E., & Aizawa, T. (2005). Fabrication of patterned domains with graphitic clusters in amorphous carbon using a combination of ion implantation and electron irradiation techniques. In Materials Research Society Symposium Proceedings (Vol. 908, pp. 108-113)

Fabrication of patterned domains with graphitic clusters in amorphous carbon using a combination of ion implantation and electron irradiation techniques. / Iwamura, Eiji; Aizawa, Tatsuhiko.

Materials Research Society Symposium Proceedings. Vol. 908 2005. p. 108-113.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Iwamura, E & Aizawa, T 2005, Fabrication of patterned domains with graphitic clusters in amorphous carbon using a combination of ion implantation and electron irradiation techniques. in Materials Research Society Symposium Proceedings. vol. 908, pp. 108-113, 2005 MRS Fall Meeting, Boston, MA, 05/11/28.
Iwamura E, Aizawa T. Fabrication of patterned domains with graphitic clusters in amorphous carbon using a combination of ion implantation and electron irradiation techniques. In Materials Research Society Symposium Proceedings. Vol. 908. 2005. p. 108-113
Iwamura, Eiji ; Aizawa, Tatsuhiko. / Fabrication of patterned domains with graphitic clusters in amorphous carbon using a combination of ion implantation and electron irradiation techniques. Materials Research Society Symposium Proceedings. Vol. 908 2005. pp. 108-113
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