Far- and Mid- Infrared Absorption Study of HfO2/SiO2/Si System

A. Toriumi, K. Tomida, H. Shimizu, K. Kita, K. Kyuno

Research output: Contribution to journalArticle

Original languageEnglish
Journal207th Meeting of the Electrochemical Society
Publication statusPublished - 2005 May 1

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