Far- and Mid- Infrared Absorption Study of HfO2/SiO2/Si System

A. Toriumi, K. Tomida, H. Shimizu, K. Kita, K. Kyuno

Research output: Contribution to journalArticle

Original languageEnglish
Journal207th Meeting of the Electrochemical Society
Publication statusPublished - 2005 May 1

Cite this

Far- and Mid- Infrared Absorption Study of HfO2/SiO2/Si System. / Toriumi, A.; Tomida, K.; Shimizu, H.; Kita, K.; Kyuno, K.

In: 207th Meeting of the Electrochemical Society, 01.05.2005.

Research output: Contribution to journalArticle

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title = "Far- and Mid- Infrared Absorption Study of HfO2/SiO2/Si System",
author = "A. Toriumi and K. Tomida and H. Shimizu and K. Kita and K. Kyuno",
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journal = "207th Meeting of the Electrochemical Society",

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AU - Toriumi, A.

AU - Tomida, K.

AU - Shimizu, H.

AU - Kita, K.

AU - Kyuno, K.

PY - 2005/5/1

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